The effect of electromagnetic fields on the process of formation of ultrathin Fe-Ni films during their deposition under a plasma-stimulated deposition

Russian Microelectronics

Volumn 38, Issue 3, 2009, Pages 165-170

  Bochkarev, V F ^a   Buchin, E Yu ^a  

^a RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTING FILMS; CONDUCTION ELECTRONS; CRITICAL THICKNESS; CRYSTALLINE STRUCTURE; CURRENT FLOWING; DEPOSITION PROCESS; GALVANOMAGNETIC PROPERTIES; GROWTH PROCESS; NI FILMS; OPTIMAL PARAMETER; POLYCRYSTALLINE; SCATTERING MECHANISMS; ULTRA-THIN;

CONDUCTIVE FILMS; ELECTROMAGNETIC FIELD MEASUREMENT; ELECTROMAGNETIC FIELDS; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; ULTRATHIN FILMS;

MAGNETIC THICK FILMS;

EID: 65649090986     PISSN: 10637397     EISSN: None     Source Type: Journal    
DOI: 10.1134/S1063739709030032     Document Type: Article

References (5)

1. V.V. Dyagilev A.N. Saurov A.A. Reznev S.I. Kasatkin A.M. Murav'ev 2007 Single-Layered Anisotropic Magnetoresistive Sensors of the Magnetic Field and Current with Inclined Strips Mikroelektronika 36 2 103 [Russian Microelectronics (Engl. Transl.), 2007, vol. 36, no. 2, p. 86] (Pubitemid 46559618)
2. Palatnik, L.S. et al., Mekhanism obrazovaniya i substruktura kondensirovannykh plenok (Mechanism of Formation and Substructure of Condensed Films), Moscow: Nauka, 1972.
3. Monokristallicheskie plenki (Single-Crystal Films), Pinsker, Z.G., Ed., Moscow: Nauka, 1966.
4. Chopra, K.L., Thin Film Phenomena, USA: McGraw-Hill, 1969.
5. RF Patent no. 2 046 840, 1995.