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Volumn 517, Issue 2, 2008, Pages 967-971
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Radio frequency sputter deposition of single phase cuprous oxide using Cu2O as a target material and its resistive switching properties
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Author keywords
Cuprous oxide; Electrical measurements and properties; Resistance random access memory; Resistive switching; Sputtering deposition; X ray diffraction; X ray photoelectron spectroscopy
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Indexed keywords
COPPER OXIDES;
CURRENT VOLTAGE CHARACTERISTICS;
DATA STORAGE EQUIPMENT;
DIFFRACTION;
ELECTRIC PROPERTIES;
ELECTROMAGNETIC WAVES;
ELECTRON SPECTROSCOPY;
NANOSTRUCTURED MATERIALS;
OXYGEN;
PHASE SEPARATION;
PHOTOELECTRICITY;
PHOTOELECTRON SPECTROSCOPY;
PHOTOIONIZATION;
PHOTONS;
RADIO;
RADIO WAVES;
RANDOM ACCESS STORAGE;
SEPARATION;
SOLIDS;
SPECTRUM ANALYSIS;
SPUTTER DEPOSITION;
SWITCHING SYSTEMS;
TARGETS;
THICK FILMS;
THIN FILMS;
TIN;
TITANIUM COMPOUNDS;
TITANIUM NITRIDE;
X RAY ANALYSIS;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
CUPROUS OXIDE;
ELECTRICAL MEASUREMENTS AND PROPERTIES;
RESISTANCE RANDOM ACCESS MEMORY;
RESISTIVE SWITCHING;
SPUTTERING DEPOSITION;
COPPER;
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EID: 55049087461
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2008.08.184 Document Type: Article |
Times cited : (79)
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References (16)
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