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Volumn 517, Issue 2, 2008, Pages 967-971

Radio frequency sputter deposition of single phase cuprous oxide using Cu2O as a target material and its resistive switching properties

Author keywords

Cuprous oxide; Electrical measurements and properties; Resistance random access memory; Resistive switching; Sputtering deposition; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

COPPER OXIDES; CURRENT VOLTAGE CHARACTERISTICS; DATA STORAGE EQUIPMENT; DIFFRACTION; ELECTRIC PROPERTIES; ELECTROMAGNETIC WAVES; ELECTRON SPECTROSCOPY; NANOSTRUCTURED MATERIALS; OXYGEN; PHASE SEPARATION; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTOIONIZATION; PHOTONS; RADIO; RADIO WAVES; RANDOM ACCESS STORAGE; SEPARATION; SOLIDS; SPECTRUM ANALYSIS; SPUTTER DEPOSITION; SWITCHING SYSTEMS; TARGETS; THICK FILMS; THIN FILMS; TIN; TITANIUM COMPOUNDS; TITANIUM NITRIDE; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 55049087461     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.08.184     Document Type: Article
Times cited : (79)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.