Fabrication of cuprous and cupric oxide thin films by heat treatment

Applied Surface Science

Volumn 255, Issue 23, 2009, Pages 9474-9479

  Jayatissa, Ahalapitiya H ^a   Guo, K ^a   Jayasuriya, Ambalangodage C ^b  

^a The University of Toledo   (United States)

^b MEDICAL COLLEGE OF OHIO   (United States)

Author keywords

Cupric oxide; Cuprous oxide; Optical transmittance; Resistivity; Thermal oxidation; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONTACTS (FLUID MECHANICS); CRYSTAL MICROSTRUCTURE; ELECTRIC CONDUCTIVITY; FABRICATION; FILM PREPARATION; HEAT TREATMENT; INDIUM COMPOUNDS; ITO GLASS; OHMIC CONTACTS; OPACITY; SUBSTRATES; THERMOOXIDATION; THIN FILMS; TIN OXIDES; X RAY DIFFRACTION;

CUPRIC OXIDE; CUPROUS OXIDE; HEAT TREATMENT TEMPERATURE; OPTICAL SPECTROSCOPY; OXIDATION CONDITIONS; OXYGEN PARTIAL PRESSURE; THERMAL OXIDATION; TRANSMITTANCE AND REFLECTANCES;

COPPER OXIDES;

EID: 69249202258     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.07.072     Document Type: Article

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