Electrical and optical properties of copper oxide films prepared by reactive RF magnetron sputtering

Physica Status Solidi (A) Applied Research

Volumn 155, Issue 2, 1996, Pages 399-404

  Parretta, A ^a   Jayaraj, M K ^a,b   Di Nocera, A ^a   Loreti, S ^a   Quercia, L ^a   Agati, A ^a  

^a ENEA   (Italy)

^b Department of Physics   (India)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER OXIDES; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC PROPERTIES; FILM PREPARATION; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OPTICAL VARIABLES MEASUREMENT; OXYGEN; PHASE COMPOSITION; REFLECTION; X RAY DIFFRACTION;

COPPER OXIDE FILMS; OPTICAL CONSTANTS; OXYGEN ARGON ATMOSPHERE; OXYGEN PARTIAL PRESSURE; REACTIVE RADIO FREQUENCY MAGNETRON SPUTTERING;

THIN FILMS;

EID: 0030173148     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.2211550213     Document Type: Article

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