Characterization of cuprous oxide films prepared by post-annealing of cupric oxide using an atmospheric nitrogen pressure plasma torch

Thin Solid Films

Volumn 517, Issue 3, 2008, Pages 1195-1199

  Han, Sheng ^a   Chen, Hong Ying ^b   Kuo, Lien Teng ^b   Tsai, Cheng Hsien ^b  

^a NATIONAL TAICHUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

Author keywords

Atmospheric pressure microwave plasma torch; Cupric oxide; Cuprous oxide

Indexed keywords

ANNEALING; ATMOSPHERIC PRESSURE; ATMOSPHERICS; CLIMATOLOGY; COPPER; COPPER OXIDES; COPPER PLATING; DIFFRACTION; ELECTROMAGNETIC WAVES; FILM PREPARATION; HOLOGRAPHIC INTERFEROMETRY; MAGNETRON SPUTTERING; METALLIC GLASS; METEOROLOGY; MICROWAVES; NITROGEN; NONMETALS; OXIDE SUPERCONDUCTORS; PLASMA JETS; PLASMA TORCHES; PLASMAS;

ANNEALED FILMS; ATMOSPHERIC NITROGENS; CUPRIC OXIDE; CUPRIC OXIDES; CUPROUS OXIDE; CUPROUS OXIDES; DIFFRACTION PEAKS; GLASS SUBSTRATES; METALLIC COPPERS; MICROWAVE PLASMA TORCHES; NITROGEN PLASMAS; OPTICAL BANDS;

OXIDE FILMS;

EID: 56949100118     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.04.104     Document Type: Article

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