Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 9 B, 2007, Pages 6254-6257

  Liu, Zhi Quan ^a,b   Mitsuishi, Kazutaka ^b   Furuya, Kazuo ^b  

^a INSTITUTE OF METAL RESEARCH   (China)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Electron beam induced deposition (EBID); Microstructure; Nanofabrlcatlon; TEM; Tungsten

Indexed keywords

DEPOSITION; ELECTRON BEAMS; ELECTRONS; MICROSTRUCTURE; NANOCRYSTALLITES; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN;

BOTTOM SURFACES; ELECTRON-BEAM-INDUCED DEPOSITION (EBID); FILM SUBSTRATES; HIGH-ENERGY ELECTRONS;

THIN FILMS;

EID: 34648815145     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6254     Document Type: Article

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