Microstructure and mechanical properties of hard Ti-Si-C-N films deposited by dc magnetron sputtering of multicomponent Ti/C/Si target

Surface and Coatings Technology

Volumn 205, Issue 21-22, 2011, Pages 5068-5072

  Onoprienko, A A ^a   Ivashchenko, V I ^a   Dub, S N ^b   Khyzhun, O Yu ^a   Timofeeva, I I ^a  

^a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

^b BAKUL INSTITUTE FOR SUPERHARD MATERIALS   (Ukraine)

Author keywords

Magnetron sputtering; Mechanical properties; Nanocomposite; Structure

Indexed keywords

AMORPHOUS PHASE; DC MAGNETRON SPUTTERING; FRICTION COEFFICIENTS; MAXIMUM VALUES; MICROSTRUCTURE AND MECHANICAL PROPERTIES; MULTICOMPONENTS; NANO-COMPOSITE STRUCTURE; NANO-INDENTATION HARDNESS; PURE TIN; SCRATCH TEST; SI (100) SUBSTRATE; SILICON CONTENTS;

AMORPHOUS FILMS; FRICTION; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; METALLIC FILMS; NANOCOMPOSITE FILMS; NANOCOMPOSITES; NANOINDENTATION; PHOTOELECTRON SPECTROSCOPY; SILICON; SILICON NITRIDE; TITANIUM NITRIDE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS SILICON;

EID: 79959529117     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.05.009     Document Type: Article

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