Deposition of nanocomposite thin films by a hybrid cathodic arc and chemical vapour technique

Surface and Coatings Technology

Volumn 201, Issue 7 SPEC. ISS., 2006, Pages 4139-4144

  Bendavid, A ^a   Martin, P J ^a   Preston, E W ^c   Cairney, J ^b   Xie, Z H ^b   Hoffman, M ^b  

^a CSIRO   (Australia)

^b UNIVERSITY OF NEW SOUTH WALES   (Australia)

^c NONE

Author keywords

Etramethylsilane; Filtered arc; Mechanical properties; Nanocomposite; TEM; Ti Si N

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; HARDNESS; NANOSTRUCTURED MATERIALS; SILICON; THIN FILMS;

FILM STRUCTURE; FILTERED ARC; HYBRID CATHODIC ARC; TETRAMETHYLSILANE;

COATING TECHNIQUES;

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; COATING TECHNIQUES; HARDNESS; NANOSTRUCTURED MATERIALS; SILICON; THIN FILMS;

EID: 33751218911     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.08.021     Document Type: Article

References (35)

1. Veprek S., and Reiprich S. Thin Solid Films 268 (1995) 64
2. Veprek S., Niederhofer A., Moto K., Bolom T., Männling H.-D., Nesladek P., Dollinger G., and Bergmair A. Surf. Coat. Technol. 133 (2000) 152
3. Veprek S., Reiprich S., and Shizhi L. Appl. Phys. Lett. 66 (1995) 2640
4. Vaz F., Rebouta L., Goudeau P., Girardeau T., Pacaud J., Rivière J.-P., and Traverse A. Surf. Coat. Technol. 146 (2001) 274
5. Schüler A., and Oelhafen P. Appl. Phys., A 73 (2001) 237
6. Patscheider J., Zehnder T., and Diserens M. Surf. Coat. Technol. 146 (2001) 201
7. Musil J. Surf. Coat. Technol. 125 (2000) 322
8. Flink A., Larsson T., Sjölen J., Karlsson L., and Hultman L. Surf. Coat. Technol. 200 (2005) 1535
9. Li Z.G., Mori M., Miyake S., Kumagai M., Saito H., and Muramatsu Y. Surf. Coat. Technol. 193 (2005) 345
10. Martin P.J., and Bendavid A. Surf. Coat. Technol. 163 (2003) 245
11. Haug F.-J., Bonderer L., Schwaller P., Patscheider J., Tobler M., and Karimi A. Compos. Sci. Technol. 65 (2005) 799
12. Park O.-N., Park J.H., Yoon S.-Y., Lee M.-H., and Kim K.H. Surf. Coat. Technol. 179 (2004) 83
13. Zhang C.H., Liu Z.-J., Li K.Y., Shen Y.G., and Luo J.B. Appl. Phys. 95 (2004) 1460
14. Colligon J.S., Vishnyakov V., Valizadeh R., Donnelly S.E., and Kumashiro S. Thin Solid Films 485 (2005) 148
15. Ma D., Ma S., and Xu K. Vacuum 79 (2005) 7
16. Veprek S. J. Vac. Sci. Technol., A, Vac. Surf. Films 17 (1999) 2401
17. Zhang S., Sun D., Fu Y., and Du H. Surf. Coat. Technol. 198 (2005) 2
18. Patscheider J. MRS Bull. 28 3 (2003) 180
19. Veprek S., Veprek-Heijman M.G.J., Karvankova P., and Prochazka J. Thin Solid Films 476 (2005) 1
20. Bendavid A., Martin P.J., and Takikawa H. Thin Solid Films 420 (2003) 241
21. Bendavid A., Martin P.J., Kinder T.J., and Preston E.W. Surf. Coat. Technol. 163 (2003) 347
22. Martin P.J., and Bendavid A. Thin Solid Films 394 (2001) 1
23. Bendavid A., Martin P.J., Cairney J.M., Hoffman M., and Fischer-Cripps A.C. Appl. Phys., A 81 (2005) 151
24. Rowlands N., and Munroe P.R. Microstruct. Sci. 26 (1998) 233
25. Cairney M., and Munroe P.R. J. Microsc. 201 (2001) 201
26. Cairney J.M., Harris S.G., Munroe P.R., and Doyle E.D. Surf. Coat. Technol. 183 (2004) 239
27. Bendavid A., Martin P.J., Netterfield R.P., and Kinder T.J. Surf. Coat. Technol. 70 (1994) 97
28. Bendavid A., Martin P.J., Wang X., Wittling M., and Kinder T.J. J. Vac. Sci. Technol., A, Vac. Surf. Films 13 3 (1995) 1658
29. Bendavid A., Martin P.J., Netterfield R.P., and Kinder T.J. Surf. Interface Anal. 24 (1996) 627
30. Stüber M., Leiste H., Ulrich S., Holleck H., and Schild D. Surf. Coat. Technol. 150 (2002) 218
31. Carvalho S., Ribeiro E., Rebouta L., Pacaud J., Goudeau Ph., Renault P.O., Rivière J.P., and Tavares C.J. Surf. Coat. Technol. 172 (2003) 109
32. Pelleg J., Zevin L.Z., and Lungo S. Thin Solid Films 197 (1991) 117
33. Liu Z.-J., Zhang C.H., Shen Y.G., and Mai Y.-W. J. Appl. Phys. 95 (2004) 758
34. Martin P.J., Bendavid A., Cairney J.M., and Hoffman M. Surf. Coat. Technol. 200 (2005) 2228
35. Bendavid A., Martin P.J., Netterfield R.P., and Kinder T.J. Surf. Coat. Technol. 70 (1994) 97