Ti-Si-C-N thin films grown by reactive arc evaporation from Ti 3SiC2 cathodes

Journal of Materials Research

Volumn 26, Issue 7, 2011, Pages 874-881

  Eriksson, Anders O ^a   Zhu, Jianqiang ^a   Ghafoor, Naureen ^a   Jensen, Jens ^a   Greczynski, Grzegorz ^a   Johansson, Mats P ^a,b   Sjölen, Jacob ^b   Odén, Magnus ^a   Hultman, Lars ^a   Rosén, Johanna ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b SECO TOOLS AB   (Sweden)

Author keywords

Film; Hardness; Physical vapor deposition

Indexed keywords

ARC EVAPORATION; CRYSTALLINE PHASIS; CUBIC PHASE; FILM COMPOSITION; GRAIN BOUNDARY PHASIS; INDUSTRIAL SCALE; N SATURATION; NANOCRYSTALLINES; NITROGEN PRESSURE; SUPERHARD;

CATHODES; COBALT; COBALT COMPOUNDS; EVAPORATION; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; HARDNESS; NITRIDES; PHASE TRANSITIONS; PHYSICAL VAPOR DEPOSITION; SILICIDES; SILICON; SILICON CARBIDE; THIN FILMS; TITANIUM COMPOUNDS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 79952738169     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/jmr.2011.10     Document Type: Article

References (35)

1. y thin films. J. Mater. Res. 24, 2483 (2009).
2. 1-x (0 ≤ x ≤ 1) films. Surf. Coat. Techol. 126, 1 (2000).
3. S. Abraham, E. Y. Choi, N. Kang, and K. H. Kim: Microstructure and mechanical properties of Ti-Si-C-N films synthesized by plasma-enhanced chemical vapor deposition. Surf. Coat. Techol. 202, 915 (2007).
4. D.-H. Kuo and K.-W. Huang: A new class of Ti-Si-C-N coatings obtained by chemical vapor deposition, Part 1:1000 °C process. Thin Solid Films 394, 72 (2001).
5. D.-H. Kuo and K.-W. Huang: A new class of Ti-Si-C-N coatings obtained by chemical vapor deposition - Part II: Low-temperature process. Thin Solid Films 394, 81 (2001).
6. D.-H. Kuo and W.-C. Liao: A new class of Ti-Si-C-N coatings obtained by chemical vapor deposition, Part III: 650-800 °C process. Thin Solid Films 419, 11 (2002).
7. Y. Guo, S. L. Ma, and K. W. Xu: Effects of carbon content and annealing temperature on the microstructure and hardness of super hard Ti-Si-C-N nanocomposite coatings prepared by pulsed d.c. PCVD. Surf. Coat. Techol. 201, 5240 (2007).
8. y/SiCN coatings prepared by plasma enhanced chemical vapor deposition. Thin Solid Films 466, 189 (2004).
9. D. Y. Ma, S. L. Ma, H. S. Dong, K. W. Xu, and T. Bell: Microstructure and tribological behavior of super-hard Ti-Si-C-N nanocomposite coatings deposited by plasma enhanced chemical vapour deposition. Thin Solid Films 496, 438 (2006).
10. D. Y. Ma, S. L. Ma, and K. W. Xu: Superhard nanocomposite Ti-Si-C-N coatings prepared by pulsed-d.c plasma enhanced CVD. Surf. Coat. Techol. 200, 382 (2005).
11. D. V. Shtansky, E. A. Levashov, A. N. Sheveiko, and J. J. Moore: The structure and properties of Ti-B-N, Ti-Si-B-N, Ti-Si-C-N, and Ti-Al-C-N coatings deposited by magnetron sputtering using composite targets produced by self-propagating high-temperature synthesis (SHS). J. Mater. Synth. Process. 6, 61 (1998).
12. D. V. Shtansky, E. A. Levashov, A. N. Sheveiko, and J. J. Moore: Synthesis and characterization of Ti-Si-C-N films. Metall. Mater. Trans. A 30, 2439 (1999).
13. H. Xu, X. Nie, and R. Wei: Tribological behavior of a TiSiCN coating tested in air and coolant. Surf. Coat. Techol. 201, 4236 (2006).
14. R. H. Wei, E. Langa, C. Rincon, and J. H. Arps: Deposition of thick nitrides and carbonitrides for sand erosion protection. Surf. Coat. Techol. 201, 4453 (2006).
15. J.-H. Jeon, S. R. Choi, W. S. Chung, and K. H. Kim: Synthesis and characterization of quaternary Ti-Si-C-N coatings prepared by a hybrid deposition technique. Surf. Coat. Techol. 188-189, 415 (2004).
16. L. J. S. Johnson, L. Rogström, M. P. Johansson, M. Odén, and L. Hultman: Microstructure evolution and age hardening in (Ti, Si) (C, N) thin films deposited by cathodic arc evaporation. Thin Solid Films 519, 1397 (2010).
17. 2 gas flow rate on synthesis and characteristics of Ti-Si-C-N coating by cathodic arc plasma evaporation. J. Mater. Process. Technol. 209, 5521 (2009).
18. M. W. Barsoum: A new class of solids: Thermodynamically stable nanolaminates. Prog. Solid State Chem. 28, 201 (2000).
19. M. S. Jansson: CONTES, Conversion of Time-Energy Spectra - a Program for ERDA Data Analysis, Uppsala University, 2004.
20. W. C. Oliver and G. M. Pharr: An improved technique for determining hardness and elastic-modulus using load and displacement sensing indentation experiments. J. Mater. Res. 7, 1564 (1992).
21. A. O. Eriksson, J. Q. Zhu, N. Ghafoor, M. P. Johansson, J. Sjölén, J. Jensen, M. Odén, L. Hultman, and J. Rosén: Layer formation by resputtering in Ti-Si-C hard coatings during large scale cathodic arc deposition. Surf. Coat. Technol. DOI: 10.1016/j.surfcoat.2011.02. 007 (2011).
22. Y. Guo, S. L. Ma, K. W. Xu, T. Bell, X. Y. Li, and H. S. Dong: On the oxidation resistance of superhard Ti-Si-C-N coatings.:J. Mater. Res. 23, 2420 (2008).
23. 3 00-029-1362, ICDD "Powder Diffraction File" (2008).
24. J. A. Sue: X-ray elastic constants and residual stress of textured titanium nitride coating. Surf. Coat. Techol. 54-55, 154 (1992).
25. A. Flink, T. Larsson, J. Sjölen, L. Karlsson, and L. Hultman: Influence of Si on the microstructure of arc evaporated (Ti, Si) N thin films; evidence for cubic solid solutions and their thermal stability. Surf. Coat. Techol. 200, 1535 (2005).
26. x embedded in TiN: A first-principles study. Phys. Rev. B 81, 212102 (2010).
27. L. Hultman, J. Bareño, A. Flink, H. Söderberg, K. Larsson, V. Petrova, M. Odén, J. E. Greene, and I. Petrov: Interface structure in superhard TiN-SiN nanolaminates and nanocomposites: Film growth experiments and ab initio calculations. Phys. Rev. B 75, 155437 (2007).
28. 4. Phys. Rev. B 60, 10855 (1999).
29. y thin films. J. Vac. Sci. Technol. A 25, 1539 (2007).
30. x thin films by reactive magnetron sputtering. Phys. Rev. B 59, 5162 (1999).
31. x (0, x, 0.25) thin solid films. Carbon 42, 2729 (2004).
32. A. Anders: A structure zone diagram including plasma-based deposition and ion etching. Thin Solid Films 518, 4087 (2010).
33. A. Anders: Cathodic Arcs, Chapter 6 (Springer, New York, 2008).
34. J. Rosén, A. Anders, S. Mraz, A. Atiser, and J. M. Schneider: Influence of argon and oxygen on charge-state-resolved ion-energy distributions of filtered aluminum arcs. J. Appl. Phys. 99, 123303 (2006).
35. P. Eklund: Novel ceramic Ti-Si-C nanocomposite coatings for electrical contact applications. Surf. Eng. 23, 406 (2007).