Spectroscopic ellipsometry analysis of TiO 2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma

Thin Solid Films

Volumn 522, Issue , 2012, Pages 366-371

  Li, D ^a   Carette, M ^a   Granier, A ^a   Landesman, J P ^a   Goullet, A ^a  

^a UNIVERSITÉ DE NANTES   (France)

Author keywords

Optical properties; Plasma enhanced chemical vapour deposition; Spectroscopic ellipsometry; Titanium dioxide

Indexed keywords

ANATASE PHASE; COLUMNAR STRUCTURES; FILM MORPHOLOGY; FILM PROPERTIES; FILM STRUCTURE; FLOATING POTENTIALS; FOURIER TRANSFORM INFRARED; INDUCTIVELY-COUPLED; LOW PRESSURES; PHYSICAL MODEL; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION; RADIO FREQUENCY PLASMA; REFRACTIVE INDEX DISPERSION; ROUGHNESS LAYERS; RUTILE PHASE; SCANNING ELECTRON MICROSCOPIC; SILICON SUBSTRATES; SUBSTRATE BIAS; TETRAISOPROPOXIDE; TIO;

AMORPHOUS FILMS; DEPOSITS; ELECTROMAGNETIC INDUCTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OPTICAL PROPERTIES; OXIDE MINERALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; STRUCTURE (COMPOSITION); TITANIUM; VAPORS; X RAY DIFFRACTION;

TITANIUM DIOXIDE;

EID: 84868590410     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.07.091     Document Type: Conference Paper

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