Mechanisms involved in the conversion of ppHMDSO films into SiO2-like by oxygen plasma treatment

Plasma Processes and Polymers

Volumn 3, Issue 4-5, 2006, Pages 365-373

  Granier, Agnès ^a   Borvon, Gael ^a   Bousquet, Angélique ^a   Goullet, Antoine ^a   Leteinturier, Christiane ^a   van der Lee, Arie ^b  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b UNIVERSITÉ DE MONTPELLIER   (France)

Author keywords

Hexamethyldisiloxane (HMDSO); Plasma polymerization; Plasma treatment; Plasma enhanced chemical vapor deposition (PE CVD); Silicon oxide

Indexed keywords

ELLIPSOMETRY; INFRARED SPECTROSCOPY; MECHANISMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; REFLECTOMETERS; SILICA;

HEXAMETHYLDISILOXANE; PLASMA TREATMENT; X-RAY REFLECTOMETRY;

PLASTIC FILMS;

EID: 33746418051     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200600022     Document Type: Article

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