Influence of ion bombardment and annealing on the structural and optical properties of TiOx thin films deposited in inductively coupled TTIP/O2 plasma

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Granier, Agnes ^a   Begou, Thomas ^a   Makaoui, K ^a   Soussou, Akram ^a   Bêche, Bruno ^b   Gaviot, Etienne ^c   Besland, Marie Paule ^a   Goullet, Antoine ^a  

^a UNIVERSITÉ DE NANTES   (France)

^b UNIVERSITÉ DE RENNES 1   (France)

^c UNIVERSITÉ DU MAINE   (France)

Author keywords

Anatase; Annealing; PE CVD; Rutile; Titanium dioxide film; TTIP; X ray

Indexed keywords

AMORPHOUS FILMS; ANNEALING; BUBBLE FORMATION; ELECTROMAGNETIC INDUCTION; ION BOMBARDMENT; NITROGEN; OXIDE MINERALS; REFRACTIVE INDEX; STRUCTURAL PROPERTIES; THIN FILMS; TITANIUM DIOXIDE; X RAYS;

COLUMNAR STRUCTURES; FLOATING POTENTIALS; HIGH REFRACTIVE INDEX; INDUCTIVELY COUPLED RF PLASMA; RUTILE; STRUCTURAL AND OPTICAL PROPERTIES; TITANIUM DIOXIDE FILMS; TTIP;

OPTICAL FILMS;

EID: 77954882176     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200931804     Document Type: Conference Paper

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