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Journal of Non-Crystalline Solids

Volumn 303, Issue 1, 2002, Pages 134-138

Nanocrystalline TiO2 films studied by optical, XRD and FTIR spectroscopy

(6) Zhang, Jun Ying a Boyd, Ian W a O'Sullivan, B J b Hurley, P K b Kelly, P V b Senateur J P c

a UNIVERSITY COLLEGE LONDON (United Kingdom)

b UNIVERSITY COLLEGE CORK (Ireland)

c LABORATOIRE DES MATÉRIAUX ET DU GÉNIE PHYSIQUE (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; REFRACTIVE INDEX; SILICA; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

NANOSTRUCTURED FILMS;

THIN FILMS;

EID: 0036567835 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(02)00973-0 Document Type: Article

Times cited : (178)

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