Broad band optical characterization of sol-gel TiO2 thin film microstructure evolution with temperature

Thin Solid Films

Volumn 518, Issue 19, 2010, Pages 5467-5470

  Phadke, Sarika ^a   Sorge, Judith D ^a   Hachtmann, Sherwood ^a   Birnie III, Dunbar P ^a  

^a Piscataway   (United States)

Author keywords

Optical properties; Spectroscopic ellipsometry; Titanium dioxide

Indexed keywords

ANNEALING TEMPERATURES; BROAD BANDS; DENSE LAYER; EXTINCTION COEFFICIENTS; OPTICAL CHARACTERIZATION; PHOTON ENERGY; SILICON WAFER SUBSTRATES; SOL-GEL PRECURSORS; SOL-GEL TIO; STRUCTURAL EVOLUTION; STRUCTURAL TRANSFORMATION; THERMAL GRAVIMETRIC ANALYSIS; THIN FILM MICROSTRUCTURES; TIO; TITANIA FILMS; TITANIA THIN FILMS; TITANIUM ISOPROPOXIDE;

ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL ATOMIC STRUCTURE; GELS; LIGHT REFRACTION; OXIDES; REFRACTIVE INDEX; REFRACTOMETERS; SILICON WAFERS; SOL-GEL PROCESS; SOL-GELS; SOLS; SPECTROSCOPIC ELLIPSOMETRY; THERMOGRAVIMETRIC ANALYSIS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; VAPOR DEPOSITION;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77955660519     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.04.021     Document Type: Article

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