Effect of substrate temperature and RF biasing on the optical properties of titania-like thin films obtained by plasma enhanced chemical vapor deposition

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Sonnenfeld, Axel ^a   Von Rohr, Philipp Rudolf ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Films; Plasma enhanced chemical vapor deposition (pe cvd); Rf self biasing; Substrate temperature; Surface; TiOx films; Uv absorption

Indexed keywords

SELF BIASING; SUBSTRATE TEMPERATURE; TIO; UV ABSORPTION;

ABSORPTION; DEPOSITION; ELECTRIC DISCHARGES; ION BOMBARDMENT; LIGHT ABSORPTION; OPTICAL PROPERTIES; PLASMA DEPOSITION; SUBSTRATES; TITANIUM; TITANIUM DIOXIDE; VAPOR DEPOSITION;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 77954938835     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200931803     Document Type: Conference Paper

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