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Applied Surface Science

Volumn 212-213, Issue SPEC., 2003, Pages 255-263

Preparation and characterization of polycrystalline anatase and rutile TiO 2 thin films by rf magnetron sputtering

(6) Miao, L a Jin, P b Kaneko, K c Terai, A d Nabatova Gabain, N d Tanemura, S a

a NAGOYA INSTITUTE OF TECHNOLOGY (Japan)

b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

c KYUSHU UNIVERSITY (Japan)

d Horiba Jobin Yvon Co Ltd (Japan)

Author keywords

Optical band gap; SE; Sputtering; TEM; TiO 2 thin films; XRD

Indexed keywords

ELLIPSOMETRY; MAGNETRON SPUTTERING; REFRACTIVE INDEX; SILICON; STRUCTURE (COMPOSITION); SUBSTRATES; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CRITICAL PARAMETERS;

THIN FILMS;

EID: 0038580413 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(03)00106-5 Document Type: Conference Paper

Times cited : (292)

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