Stress and texture development during sputtering of yttria, zirconia, and yttria stabilized zirconia films on Si substrates

Journal of Applied Physics

Volumn 112, Issue 7, 2012, Pages

  Narayanachari, K V L V ^a   Raghavan, Srinivasan ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

BUFFER LAYER MATERIALS; DIRECT CURRENT SPUTTERING; DYNAMIC PHENOMENA; FUNCTIONAL OXIDES; GROWTH STRESS; GROWTH SURFACES; IN-SITU; IN-SITU STUDY; NUCLEATION STAGES; RADIO FREQUENCIES; SI SUBSTRATES; SI(1 0 0); STEADY STATE STRESS; STRESS EVOLUTION; TEXTURE DEVELOPMENT; TEXTURE EVOLUTIONS; YTTRIA-STABILIZED ZIRCONIA FILMS;

GRAIN BOUNDARIES; NUCLEATION; SILICON; TEXTURES; YTTRIA STABILIZED ZIRCONIA; ZIRCONIA;

FILM GROWTH;

EID: 84867558154     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4757924     Document Type: Article

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