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Volumn 27, Issue 1, 2002, Pages

Physical origins of intrinsic stresses in Volmer-Weber thin films

(4) Floro, Jerrold A a Chason, Eric a Cammarata, Robert C a Srolovitz, David J a

a SANDIA NATIONAL LABORATORIES (United States)

Author keywords

Intrinsic stress; Physical vapor deposition; Thin films

Indexed keywords

ARSENIC; COALESCENCE; COMPRESSIVE STRESS; FILM GROWTH; GRAIN BOUNDARIES; GRAIN GROWTH; PHYSICAL VAPOR DEPOSITION; TENSILE STRESS;

INTRINSIC STRESSES;

THIN FILMS;

EID: 0036148119 PISSN: 08837694 EISSN: None Source Type: Journal
DOI: 10.1557/mrs2002.15 Document Type: Review

Times cited : (291)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.