Effects of substrate temperatures on the crystallizations and microstructures of electron beam evaporation YSZ thin films

Journal of Alloys and Compounds

Volumn 500, Issue 1, 2010, Pages 82-86

  Huang, Hong Hsin ^a   Diao, Chien Chen ^b   Yang, Cheng Fu ^c   Huang, Chien Jung ^c  

^a CHENG SHIU UNIVERSITY   (Taiwan)

^b KAO YUAN UNIVERSITY   (Taiwan)

^c NATIONAL UNIVERSITY OF KAOHSIUNG   (Taiwan)

Author keywords

E beam evaporation; Substrate temperature; Textured structure; YSZ

Indexed keywords

AMORPHOUS INTERLAYERS; CRYSTALLINE STRUCTURE; DIFFERENT SUBSTRATES; E BEAM EVAPORATION; ELECTRON BEAM EVAPORATION; MINIMUM VALUE; REFLECTION INTENSITY; REFLECTION PEAKS; ROOM TEMPERATURE; SI WAFER; SI(1 0 0); SUBSTRATE TEMPERATURE; YSZ THIN FILMS; YTTRIA-STABILIZED ZIRCONIA THIN FILMS;

AMORPHOUS FILMS; AMORPHOUS SILICON; ELECTRON BEAMS; EVAPORATION; GRAIN GROWTH; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LATTICE MISMATCH; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; STRAIN; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; YTTRIA STABILIZED ZIRCONIA; ZIRCONIA;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77953134411     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.03.216     Document Type: Article

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