|
Volumn 484, Issue 1-2, 2005, Pages 18-25
|
Influence of the Ar/O2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering
|
Author keywords
Electron microscopy; Faceting; Sputtering; Zirconia
|
Indexed keywords
ANISOTROPY;
ARGON;
DEPOSITION;
ELECTRON MICROSCOPY;
GROWTH KINETICS;
MAGNETRON SPUTTERING;
MATHEMATICAL MODELS;
OXYGEN;
PLASMAS;
SPUTTERING;
STAINLESS STEEL;
YTTRIUM COMPOUNDS;
ADATOM MOBILITY;
FACETING;
GROWTH RATES;
PLASMA COMPOSITION;
ZIRCONIA;
|
EID: 19844375516
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2005.01.021 Document Type: Article |
Times cited : (26)
|
References (21)
|