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Volumn 484, Issue 1-2, 2005, Pages 18-25

Influence of the Ar/O2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering

Author keywords

Electron microscopy; Faceting; Sputtering; Zirconia

Indexed keywords

ANISOTROPY; ARGON; DEPOSITION; ELECTRON MICROSCOPY; GROWTH KINETICS; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; OXYGEN; PLASMAS; SPUTTERING; STAINLESS STEEL; YTTRIUM COMPOUNDS;

EID: 19844375516     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.01.021     Document Type: Article
Times cited : (26)

References (21)
  • 9
    • 0003495856 scopus 로고    scopus 로고
    • International Centre for Diffraction Data, pattern n° 00-030-1468
    • Powder Diffraction file, International Centre for Diffraction Data, pattern n° 00-030-1468.
    • Powder Diffraction File


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.