3D Free-form patterning of silicon by ion implantation, silicon deposition, and selective silicon etching

Advanced Functional Materials

Volumn 22, Issue 19, 2012, Pages 4004-4008

  Fischer, Andreas C ^a   Belova, Lyubov M ^a   Rikers, Yuri G M ^b   Malm, B Gunnar ^a   Radamson, Henry H ^a   Kolahdouz, Mohammadreza ^a   Gylfason, Kristinn B ^a   Stemme, Göran ^a   Niklaus, Frank ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b Thermo Fisher Scientific   (United States)

Author keywords

3D silicon patterning; additive layer by layer fabrication; focused ion beam (FIB) implantation; microelectromechanical systems; nanostructures

Indexed keywords

3D SILICON PATTERNING; 3D STRUCTURE; ETCHING SELECTIVITY; LAYER-BY-LAYER FABRICATION; MICRO AND NANOSTRUCTURES; SILICON DEPOSITION; SILICON ETCHING; SILICON LAYER; SUSPENDED BEAMS;

CHEMICAL VAPOR DEPOSITION; ELECTROMECHANICAL DEVICES; ETCHING; FABRICATION; FOCUSED ION BEAMS; ION IMPLANTATION; MEMS; NANOSTRUCTURES; POTASSIUM HYDROXIDE; THREE DIMENSIONAL COMPUTER GRAPHICS; VAPORS;

SILICON;

EID: 84867061585     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201200845     Document Type: Article

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