Fabrication of Si microstructures using focused ion beam implantation and reactive ion etching

Journal of Micromechanics and Microengineering

Volumn 18, Issue 3, 2008, Pages

  Qian, H X ^a   Zhou, Wei ^b   Miao, Jianmin ^b   Lim, Lennie E N ^b   Zeng, X R ^a  

^a SHENZHEN UNIVERSITY   (China)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

FOCUSED ION BEAMS; GALLIUM COMPOUNDS; REACTIVE ION ETCHING; SILICON COMPOUNDS;

ETCH STOP; ION DOSE; SI MICROSTRUCTURES;

MICROSTRUCTURE;

EID: 42549146398     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/3/035003     Document Type: Article

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