Systematic studies of functionalized calixarenes as negative tone electron beam resist

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 359-362

  Prins, F E ^a   Pfeiffer, J ^a   Raible, S ^a   Kern, D P ^a   Schurig, V ^a  

^a UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; EXPERIMENTS; IRRADIATION; SEMICONDUCTING SILICON;

FUNCTIONALIZED CALIXARENES; NEGATIVE TONE;

PHOTORESISTS;

EID: 0031704825     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00083-5     Document Type: Article

References (6)

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5. Eggo U. Thoden van Velzen, Johan F.J. Engbersen, David N. Reinhoudt, Synthesis, 989 (1995).
6. S. Strähle, K.-D. Schock, F.E. Prins, D.P. Kern, Microelec. Eng. 35, 465 (1997)