Metal-to-multilayer-graphene contact part I: Contact resistance modeling

IEEE Transactions on Electron Devices

Volumn 59, Issue 9, 2012, Pages 2444-2452

  Khatami, Yasin ^a   Li, Hong ^a   Xu, Chuan ^a,b   Banerjee, Kaustav ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b MAXIM INTEGRATED PRODUCTS   (United States)

Author keywords

1 D contact model; Contact resistance; edge contact; multilayer graphene (MLG); top contact

Indexed keywords

1-D MODELS; 3D MODELS; CONTACT INTERFACE; CONTACT MODELS; EDGE CONTACTS; GEOMETRIC SCALING; KEY FACTORS; METAL ELECTRODES; MODEL-BASED OPC; NANOSCALE ELECTRONIC DEVICES; PARASITIC COMPONENTS; RESISTANCE MODELING; TOP CONTACT; TOTAL RESISTANCE;

CONTACT RESISTANCE; CONTACTS (FLUID MECHANICS); GRAPHENE; METALS; MULTILAYERS;

THREE DIMENSIONAL;

EID: 84865386025     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2012.2205256     Document Type: Article

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