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Volumn 100, Issue 3, 2012, Pages

Graphene thickness-graded transistors with reduced electronic noise

Author keywords

[No Author keywords available]

Indexed keywords

1/F NOISE; DEVICE CHANNEL; ELECTRONIC NOISE; GRAPHENE DEVICES; HIGH ELECTRON MOBILITY; LOWER NOISE; METAL-DOPING; SINGLE LAYER; SOURCE AND DRAINS;

EID: 84863055295     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3676277     Document Type: Article
Times cited : (55)

References (31)
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    • Y.-M. Lin and P. Avouris, Nano Lett. 8, 2119 (2008). 10.1021/nl080241l
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  • 14
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    • DOI 10.1063/1.2771379
    • I. Calizo, F. Miao, W. Bao, C. N. Lau, and A. A. Balandin, Appl. Phys. Lett. 91, 071913 (2007). 10.1063/1.2771379 (Pubitemid 47283546)
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  • 22
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    • Higherature quenching of electrical resistance in graphene interconnects
    • DOI 10.1063/1.2927371
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.