Metal-to-multilayer-graphene contact part II: Analysis of contact resistance

IEEE Transactions on Electron Devices

Volumn 59, Issue 9, 2012, Pages 2453-2460

  Khatami, Yasin ^a   Li, Hong ^a   Xu, Chuan ^b   Banerjee, Kaustav ^a  

^a University of California   (United States)

^b MAXIM INTEGRATED PRODUCTS   (United States)

Author keywords

1 D contact model; Contact resistance; edge contact; multilayer graphene (MLG); top contact

Indexed keywords

CONTACT MODELS; CONTACT STRUCTURE; CONVENTIONAL METHODS; CURRENT CROWDING EFFECT; CURRENT DISTRIBUTION; DEVELOPED MODEL; EDGE CONTACTS; GRAPHENE LAYERS; METAL ELECTRODES; METAL RESISTANCES; METAL RESISTIVITY; SHEET RESISTIVITY; THEORETICAL MODELS; TOP CONTACT; TOTAL RESISTANCE;

CONTACT RESISTANCE; GRAPHENE; MULTILAYERS;

METALS;

EID: 84865358059     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2012.2205257     Document Type: Article

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