A fast thermal-curing nanoimprint resist based on cationic polymerizable epoxysiloxane

Nanoscale Research Letters

Volumn 7, Issue , 2012, Pages

  Zhang, Jizong ^a   Hu, Xin ^a   Zhang, Jian ^a   Cui, Yushang ^a   Yuan, Changsheng ^a   Ge, Haixiong ^a   Chen, Yanfeng ^a   Wu, Wei ^b   Xia, Qiangfei ^c  

^a NANJING UNIVERSITY   (China)

^b HEWLETT PACKARD LABORATORIES   (United States)

^c University of Massachusetts   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; ETCHING; HYDROSILYLATION; OLIGOMERS; VISCOSITY;

CHEMICAL AND PHYSICAL PROPERTIES; CROSS-LINKING DENSITY; DIFFERENT GEOMETRY; MODERATE TEMPERATURE; NANO-SCALE PATTERNS; NANOIMPRINT PROCESS; POLIES (METHYLHYDROSILOXANE); THERMAL POLYMERIZATIONS;

CURING;

EID: 84864015951     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-7-380     Document Type: Article

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