mr-NIL 6000LT - Epoxy-based curing resist for combined thermal and UV nanoimprint lithography below 50 °C

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 722-725

  Schuster, Christine ^a   Reuther, Freimut ^a   Kolander, Anett ^a   Gruetzner, Gabi ^a  

^a MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

Curing polymer; Epoxy resist; Low imprint temperature; Nanoimprint lithography

Indexed keywords

ELEVATED TEMPERATURES; EPOXY RESIST; EXPOSURE-TIME; HOLD TIME; IMPRINT TEMPERATURES; LOW IMPRINT TEMPERATURE; MATERIAL DEVELOPMENT; MATERIAL SYSTEMS; METALLIZATION; NANO IMPRINTINGS; NANO-IMPRINT LITHOGRAPHIES; PHOTO ACID GENERATORS; POLYMER PATTERNS; POLYMER SYSTEMS; POLYMERISATION; POST EXPOSURES; PREBAKE; ROOM TEMPERATURES; SHORT CYCLES; SOLID FILMS; SPIN-COATING; THERMAL STABILITIES; UV EXPOSURES; UV-NANOIMPRINT LITHOGRAPHIES;

CURING; DIMENSIONAL STABILITY; EPOXY RESINS; PHOTORESISTS; POLYMER FILMS; POLYMERS; RESINS; SYSTEM STABILITY;

NANOIMPRINT LITHOGRAPHY;

EID: 67349119443     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.12.018     Document Type: Article

References (2)

1. C. Schuster, M. Kubenz, F. Reuther, M. Fink, G. Grützner, mr-NIL 6000 - New epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography, in: Proceedings of SPIE 6517 2007, 65172B.
2. A. Klukowska, A. Kolander, I. Bergmair, M. Mühlberger, H. Leichtfried, F. Reuther, G. Grützner, R. Schöftner, Micro- and nano-engineering 2008, International conference, Athens, Greece, Sept. 15-18, 2008.