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Volumn , Issue , 2008, Pages 389-392

UV-assisted thermal imprint of SU-8 using nickel mold

Author keywords

Micro pattern; Ni mold; SU 8; Surface pre treatment; UV assisted thermal imprint

Indexed keywords

ASPECT RATIO; CHEMICAL STABILITY; CURING; DRYING; FLOW CONTROL; MOLDS; NICKEL; NICKEL ALLOYS; PAINTING;

EID: 50249128108     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSMA.2008.4505559     Document Type: Conference Paper
Times cited : (1)

References (11)
  • 1
    • 0037231215 scopus 로고    scopus 로고
    • Influence of processing conditions on the thermal and mechanical properties of SU8 negative photoresist coatings
    • R. Feng and R. J. Farris, "Influence of processing conditions on the thermal and mechanical properties of SU8 negative photoresist coatings," J. Micromech. Microeng., Vol. 13, pp. 80-88, 2003.
    • (2003) J. Micromech. Microeng , vol.13 , pp. 80-88
    • Feng, R.1    Farris, R.J.2
  • 2
    • 33750841547 scopus 로고    scopus 로고
    • Multilayer SU-8 based microdispenser for microarray assay
    • B. Xu, Y. -K. Lee, Q. Jin, J. Zhao, C. -M. Ho, "Multilayer SU-8 based microdispenser for microarray assay," Sensor. Actuat. A, Vol. 132, pp. 714-725, 2006.
    • (2006) Sensor. Actuat. A , vol.132 , pp. 714-725
    • Xu, B.1    Lee, Y.-K.2    Jin, Q.3    Zhao, J.4    Ho, C.-M.5
  • 3
    • 0036734816 scopus 로고    scopus 로고
    • A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photoresist
    • C. H. Lin, G. B. Lee, B. W. Chang, and G. L. Chang, "A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photoresist," J. Micromech. Microeng, Vol. 12, pp. 590-597, 2002.
    • (2002) J. Micromech. Microeng , vol.12 , pp. 590-597
    • Lin, C.H.1    Lee, G.B.2    Chang, B.W.3    Chang, G.L.4
  • 4
    • 33749320935 scopus 로고    scopus 로고
    • Three-dimensional SU-8 structures by reversal UV imprint
    • W. Hu, B. Yang, C. Peng, and S. W. Pang, "Three-dimensional SU-8 structures by reversal UV imprint," J. Vac. Sci. Technol. B, Vol. 24, No. 5, pp. 2225-2229, 2006.
    • (2006) J. Vac. Sci. Technol. B , vol.24 , Issue.5 , pp. 2225-2229
    • Hu, W.1    Yang, B.2    Peng, C.3    Pang, S.W.4
  • 5
    • 1842639896 scopus 로고    scopus 로고
    • A combined-nanoimprint-and-photolithography pattering technique
    • X. Chang and L. J. Guo, "A combined-nanoimprint-and-photolithography pattering technique," Microeng. Eng., Vol. 71, pp.277-282, 2004.
    • (2004) Microeng. Eng , vol.71 , pp. 277-282
    • Chang, X.1    Guo, L.J.2
  • 6
    • 34247588697 scopus 로고    scopus 로고
    • High density patterns fabricated in SU-8 by UV curing nanoimprint
    • X. Wang, Y. Chen, S. Banu, H. Morgan, S. Fu, and Z. Cui, "High density patterns fabricated in SU-8 by UV curing nanoimprint," Microeng. Eng., Vol. 84, pp. 872-876, 2007.
    • (2007) Microeng. Eng , vol.84 , pp. 872-876
    • Wang, X.1    Chen, Y.2    Banu, S.3    Morgan, H.4    Fu, S.5    Cui, Z.6
  • 7
  • 8
    • 0035450409 scopus 로고    scopus 로고
    • Characterization and application of a UV-based imprint technique
    • M. Otto, M. Bender, B. Hadam, B. Spangenberg, and H. Kurz, "Characterization and application of a UV-based imprint technique," Microeng. Eng., Vol. 57-58, pp. 361-366, 2004.
    • (2004) Microeng. Eng , vol.57-58 , pp. 361-366
    • Otto, M.1    Bender, M.2    Hadam, B.3    Spangenberg, B.4    Kurz, H.5
  • 9
    • 0042363332 scopus 로고    scopus 로고
    • Evaluation of line edge roughness in nanoimprint lithography using photocurable polymer
    • Y. Kurashima, M. Komuro, H. Hiroshima, J. Taniguchi and I. Miyamoto, "Evaluation of line edge roughness in nanoimprint lithography using photocurable polymer," Jpn. J. Appl. Phys. Vol. 42, pp. 3871-3873, 2003.
    • (2003) Jpn. J. Appl. Phys , vol.42 , pp. 3871-3873
    • Kurashima, Y.1    Komuro, M.2    Hiroshima, H.3    Taniguchi, J.4    Miyamoto, I.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.