A novel liquid thermal polymerization resist for nanoimprint lithography with low shrinkage and high flowability

Nanotechnology

Volumn 18, Issue 6, 2007, Pages

  Liao, Wen Chang ^a   Hsu, Steve Lien Chung ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

POLYETHYLENE TEREPHTHALATES; POLYMERIZATION; POLYMETHYL METHACRYLATES; VISCOSITY;

LIQUID THERMAL POLYMERIZATION; MICROSCALED PATTERNS; PLASTIC SUBSTRATES; SPACE PATTERNS;

NANOIMPRINT LITHOGRAPHY;

ACRYLIC ACID; BUTYRONITRILE; METHACRYLIC ACID METHYL ESTER; POLY(METHYL METHACRYLATE);

ADDITION REACTION; ARTICLE; LIQUID; POLYMERIZATION; PRIORITY JOURNAL; ROOM TEMPERATURE; THERMAL ANALYSIS; VISCOSITY;

LITHOGRAPHY; POLYETHYLENE TEREPHTHALATE; POLYMERIZATION; POLYMETHYL METHACRYLATE; VISCOSITY;

EID: 33947504463     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/6/065303     Document Type: Article

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