Experimental study of improved nano-imprint process by using SU-8 3000NIL resist

Journal of Photopolymer Science and Technology

Volumn 19, Issue 3, 2006, Pages 393-396

  Ono, Yoshiyuki ^a   Honda, Nao ^a   Mori, Satoshi ^a   Kono, Yoshihiko ^b   Sekiguchi, Atushi ^b  

^a NIPPON KAYAKU CO LTD   (Japan)

^b Jpn   (Japan)

Author keywords

Chemically amplified negative resist; MEMS; Nano imprint; SU 8

Indexed keywords

EID: 33747394073     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.393     Document Type: Article

References (6)

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