Growth morphology and electrical/optical properties of Al-doped ZnO thin films grown by atomic layer deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 2, 2012, Pages

  Dhakal, Tara ^a   Vanhart, Daniel ^a   Christian, Rachel ^a   Nandur, Abhishek ^a   Sharma, Anju ^a   Westgate, Charles R ^a  

^a BINGHAMTON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZINC OXIDE FILMS; AL-DOPED ZNO; AL-DOPING; ATOMIC FORCE MICROSCOPIES (AFM); AZO FILMS; CYCLE TIME; DOPING RANGE; ELECTRICAL/OPTICAL PROPERTIES; FLOAT-GLASS; GLASS SUBSTRATES; GROWTH MORPHOLOGY; HALL EFFECT MEASUREMENT; HIGHER TEMPERATURES; OPTICAL CHARACTERIZATION; RANDOM TEXTURES; ROUGHNESS ANALYSIS; SI(1 0 0); SINGLE-CRYSTALLINE; SOLAR-CELL APPLICATIONS; TRANSPARENT CONDUCTING OXIDE; VISIBLE REGION; ZINC OXIDE (ZNO); ZNO;

ALUMINUM; ARGON; ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; ELECTRIC PROPERTIES; ENERGY GAP; FILM GROWTH; GROWTH RATE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HYDROGEN; MORPHOLOGY; OPTICAL FILMS; SILICON; SUBSTRATES; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

SEMICONDUCTOR DOPING;

EID: 84863402822     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3687939     Document Type: Article

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