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Volumn 519, Issue 1, 2010, Pages 31-36
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Room temperature deposition of Al-doped ZnO films on quartz substrates by radio-frequency magnetron sputtering and effects of thermal annealing
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Author keywords
Aluminum oxide; Hall effect; Optical properties; Quartz; Sputtering; X ray diffraction; X ray photoelectron spectroscopy (XPS); Zinc oxide
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Indexed keywords
ADSORBED OXYGEN;
AL-DOPED ZINC OXIDE;
AL-DOPED ZNO;
ALUMINUM OXIDES;
ANNEALING TREATMENTS;
AZO FILMS;
CHARACTERIZATION TECHNIQUES;
CRYSTALLINITIES;
DONOR CENTERS;
ELECTRICAL AND OPTICAL PROPERTIES;
ELECTRICAL STABILITY;
ELECTRODE LAYERS;
HIGH QUALITY;
HYDROGEN TREATMENTS;
OPTICAL TRANSMISSIONS;
OPTOELECTRONIC DEVICE FABRICATION;
POST DEPOSITION ANNEALING;
QUARTZ SUBSTRATE;
RADIO-FREQUENCY-MAGNETRON SPUTTERING;
ROOM TEMPERATURE;
ROOM TEMPERATURE DEPOSITION;
THERMAL-ANNEALING;
THIN FILM SOLAR CELLS;
TRANSPARENT CONDUCTIVE OXIDES;
ZNO MATRIX;
ALUMINUM;
ANNEALING;
CARRIER CONCENTRATION;
CONDUCTIVE FILMS;
DESORPTION;
DIFFRACTION;
DISPLAY DEVICES;
ELECTRONS;
GRAIN BOUNDARIES;
GYRATORS;
HALL EFFECT;
LIGHT TRANSMISSION;
MAGNETIC FIELD EFFECTS;
OPTICAL FILMS;
OPTICAL PROPERTIES;
OPTOELECTRONIC DEVICES;
OXIDE FILMS;
OXYGEN;
OXYGEN VACANCIES;
PHOTOELECTRICITY;
PHOTONS;
QUARTZ;
SCANNING ELECTRON MICROSCOPY;
SOLAR CELLS;
SUBSTRATES;
THIN FILMS;
X RAY DIFFRACTION;
X RAYS;
ZINC;
ZINC OXIDE;
X RAY PHOTOELECTRON SPECTROSCOPY;
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EID: 77957723193
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2010.07.048 Document Type: Article |
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Times cited : (95)
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References (24)
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