A one-dimensional hybrid simulation of DC/RF combined driven capacitive plasma

Plasma Science and Technology

Volumn 14, Issue 1, 2012, Pages 32-36

  Wang, Shuai ^a   Xu, Xiang ^b   Wang, Younian ^b  

^a NORTHEASTERN UNIVERSITY   (China)

^b DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

capacitively coupled plasmas; DC RF combined driven; hybrid model; IADs; IEDs

Indexed keywords

CAPACITIVELY COUPLED PLASMAS; DC/RF COMBINED DRIVEN; HYBRID MODEL; IADS; IEDS;

COMPUTER SIMULATION; INDUCTIVELY COUPLED PLASMA; IONS; PLASMA DENSITY;

ELECTRIC DISCHARGES;

EID: 84863012789     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/14/1/08     Document Type: Article

References (31)

1. Lieberman M A, Lichtenberg A J 1994 Principles of Plasma Discharges and Material Processing (New York: Weley)
2. Kim H C, Lee J K, Shon J W 2003 Phys. Plasmas 10 45453
3. Rauf S and Kushner M J 1999 IEEE Trans. Plasma Sci. 27 1329
4. Rauf S 2003 IEEE Trans. Plasma Sci. 31 4715
5. Salabas A, Peter R 2005 Plasma Sources Sci. Technol. 14 S53
6. Guan Z Q, Dai Z L, Wang Y N Phys. Plasma 12 123502
7. Georgieva V, Bogaerts A, Gijbels R 2003 J. Appl. Phys. 94 37488
8. Georgieva V, Bogaerts A, Gijbels R 2004 Phys. Rev. E 69 026406
9. Georgieva V, Bogaerts A 2006 Phys. Rev. E 73 036402
10. Kim H C, Lee J K 2005 J. Vac. Sci. Technol. A 23 651
11. Lee J K, Manuilenko O V, Babaeva N Y, et al 2005 Plasma Sources Sci. Technol. 14 89
12. Yamamoto K, Okuda T 1956 Appl. Sci. Res. 5 144
13. Kohler K, Coburn J W, Horne D E, et al 1985 J. Appl. Phys. 57 59
14. Alves L L, Ferreira C M 1991 J. Phys. D: Appl. Phys. 24 581
15. Hassan Z, Fujita H 1998 J. Phys. D: Appl. Phys. 31 2281
16. Shaw D M, Watanabe M, Collins G J, et al 1999 Japan. J. Appl. Phys. Part 1 38 4590
17. Shaw D M, Watanabe M, Uchiyama H, et al 1999 Appl. Phys. Lett. 75 34
18. Watanabe M, Shaw D M, Collins G J 2001 Appl. Phys. Lett. 79 2698
19. Lisovskiy V A, Kharchenko N D, Yegorenkov V D 2008 J. Phys. D: Appl. Phys. 41 125207
20. Lisovskiy V A, Kharchenko N D, Yegorenkov V D 2010 J. Phys. D: Appl. Phys. 43 425202
21. Denpoh K, Ventzek P L G 2008 J. Vac. Sci. Technol. A 26 1415
22. Kawamura E, Lieberman M A, Lichtenberg A J, et al 2007 J. Vac. Sci. Technol. A 25 1456
23. Kawamura E, Lichtenberg A J, Lieberman M A 2008 Plasma Sources Sci. Technol. 17 045002
24. Akhtar K, Scharer J E, Mills R L 2009 J. Phys. D: Appl. Phys. 42 135207
25. Lai W T, Hwang C J, Wang A T, et al 2006 Proc. Int. Symp.on Dry Process Institute of Electrical Engineers (Japan)
26. Jiang Wei, Xu Xiang, Dai Zhongling, et al 2008 Phys. Plasmas 15 033502
27. Zhang Quanzhi, Jiang Wei, Zhao Shuxia, et al 2010 J. Vac. Sci. Technol. A 28 287
28. Wang Shuai, Xu Xiang, Song Yuanhong, et al 2008 Plasma Sci. Technol. 10 57
29. Passchier J D P, Goedheer W J 1993 J. Appl. Phys. 74 3744
30. Boris J P, Book D L 1997 J. Comput. Phys. 135 172
31. Wang S, Xu X, Wang Y N 2007 Phys. Plasmas 14 113501