Negative ion behavior in single- and dual-frequency plasma etching reactors: Particle-in-cell/Monte Carlo collision study

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 73, Issue 3, 2006, Pages

  Georgieva, V ^a   Bogaerts, A ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DETACHMENT; GROUNDED ELECTRODES; RADIO-FREQUENCY DISCHARGES;

ABSORPTION; COMPUTER SIMULATION; ELECTRODES; MONTE CARLO METHODS; NATURAL FREQUENCIES; NEGATIVE IONS; PLASMA ETCHING; PLASMA SHEATHS;

NUCLEAR REACTORS;

EID: 33644745368     PISSN: 15393755     EISSN: 15502376     Source Type: Journal    
DOI: 10.1103/PhysRevE.73.036402     Document Type: Article

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