Dynamic potential formation of a rf sheath near the substrate in a dc discharge plasma

Journal of Physics D: Applied Physics

Volumn 31, Issue 18, 1998, Pages 2281-2285

  Hassan, Zahedul ^a   Fujita, Hiroharu ^a  

^a SAGA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; PLASMA DENSITY; SUBSTRATES;

FREQUENCY DEPENDENCE; PLASMA DISCHARGES;

PLASMA SHEATHS;

EID: 0032164881     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/31/18/013     Document Type: Article

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