Cluster secondary ion mass spectrometry and the temperature dependence of molecular depth profiles

Analytical Chemistry

Volumn 84, Issue 9, 2012, Pages 3981-3989

  Mao, Dan ^a   Wucher, Andreas ^b   Brenes, Daniel A ^a   Lu, Caiyan ^a   Winograd, Nicholas ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; ATOMIC FORCE MICROSCOPE (AFM); CHEMICAL DAMAGES; CLUSTER ION BEAMS; DAMAGE LEVEL; DEPTH PROFILE; DEPTH RESOLUTION; EROSION DEPTH; EROSION DYNAMICS; EROSION RATES; FLUENCES; FUNDAMENTAL FACTORS; HIGHER TEMPERATURES; INFLUENCE PARAMETER; ION BEAM MIXING; MODEL SYSTEM; MOLECULAR DEPTH; MOLECULAR DEPTH PROFILING; ORGANIC MATERIALS; REFERENCE MATERIAL; SECONDARY IONS; SIGNAL DECAY; SIGNAL RESPONSE; SPUTTERING YIELDS; STEADY-STATE CONDITION; TEMPERATURE DEPENDENCE; TEMPERATURE REDUCTION; THERMALLY ACTIVATED; THRESHOLD TEMPERATURES;

ATOMIC FORCE MICROSCOPY; ION BEAMS; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SURFACE ROUGHNESS;

EROSION;

BUTYLCRESOL; DRUG DERIVATIVE; ION; IRGANOX 3114;

ARTICLE; ATOMIC FORCE MICROSCOPY; CALIBRATION; CHEMISTRY; MASS SPECTROMETRY; METHODOLOGY; SURFACE PROPERTY; TEMPERATURE;

BUTYLATED HYDROXYTOLUENE; CALIBRATION; IONS; MICROSCOPY, ATOMIC FORCE; SPECTROMETRY, MASS, SECONDARY ION; SURFACE PROPERTIES; TEMPERATURE;

EID: 84860487207     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac2032589     Document Type: Article

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