Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams

Rapid Communications in Mass Spectrometry

Volumn 23, Issue 20, 2009, Pages 3264-3268

  Ninomiya, Satoshi ^a,b   Ichiki, Kazuya ^a   Yamada, Hideaki ^a   Nakata, Yoshihiko ^a   Seki, Toshio ^a,b   Aoki, Takaaki ^a,b   Matsuo, Jiro ^a,b  

^a KYOTO UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; DEPTH PROFILING; DIFFUSION; INTERFACES (MATERIALS); ION BEAMS; ION BOMBARDMENT; MULTILAYERS; PRODUCT DEVELOPMENT; SECONDARY ION MASS SPECTROMETRY;

ARGON CLUSTERS; CLUSTER ION BEAMS; LINEAR TYPES; MOLECULAR DEPTH PROFILING; MOLECULAR IONS; MULTILAYER STRUCTURES; ORGANIC MULTILAYERS; ORGANIC SEMICONDUCTOR MATERIALS; SECONDARY ION-MASS SPECTROMETRY; TRIS(8-HYDROXYQUINOLINE) ALUMINUM;

MOLECULES;

EID: 70449382392     PISSN: 09514198     EISSN: 10970231     Source Type: Journal    
DOI: 10.1002/rcm.4250     Document Type: Article

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