Molecular depth profiling with cluster secondary ion mass spectrometry and wedges

Analytical Chemistry

Volumn 82, Issue 1, 2010, Pages 57-60

  Mao, Dan ^a   Wucher, Andreas ^b   Winograd, Nicholas ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRATER DEPTH; CROSS SECTION; DELTA LAYERS; DEPTH RESOLUTION; EROSION RATES; IRGANOX 1010; IRGANOX 3114; MOLECULAR DEPTH; MOLECULAR DEPTH PROFILING;

ATOMIC FORCE MICROSCOPY; MASS SPECTROMETERS; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SPECTROMETRY; SURFACE TOPOGRAPHY;

DEPTH PROFILING;

BUTYLCRESOL; DRUG DERIVATIVE;

ARTICLE; ARTIFICIAL MEMBRANE; ATOMIC FORCE MICROSCOPY; MASS SPECTROMETRY; METHODOLOGY;

BUTYLATED HYDROXYTOLUENE; MASS SPECTROMETRY; MEMBRANES, ARTIFICIAL; MICROSCOPY, ATOMIC FORCE;

EID: 75749112125     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac902313q     Document Type: Article

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