Intrinsic work function of molecular films

Thin Solid Films

Volumn 520, Issue 11, 2012, Pages 3975-3986

  Ivančo, Ján ^a  

^a INSTITUTE OF PHYSICS   (Slovakia)

Author keywords

Electronic structure; Interface dipole; Interface work function; Ionisation energy; Molecular films; Molecular orientation

Indexed keywords

ELECTROACTIVE; ELEMENTAL SURFACES; INTERFACE DIPOLE; MOLECULAR FILMS;

ELECTRONIC PROPERTIES; ELECTRONIC STRUCTURE; IONIZATION; MOLECULAR ORIENTATION; OLIGOMERS; WORK FUNCTION;

INTERFACES (MATERIALS);

EID: 84858342319     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.01.035     Document Type: Article

References (91)

1. P. Stadler, A.M. Track, M. Ullah, H. Sitter, G.J. Matt, G. Koller, T.B. Singh, H. Neugebauer, N.S. Sariciftci, and M.G. Ramsey Org. Electron. 11 2 2010 207
2. G. Koller, S. Berkebile, J. Ivanco, F.P. Netzer, and M.G. Ramsey Surf. Sci. 601 24 2007 5683
3. J. Ivanco, B. Winter, F.P. Netzer, and M.G. Ramsey Adv. Mater. 15 21 2003 1812
4. J. Ivanco, J.R. Krenn, M.G. Ramsey, F.P. Netzer, T. Haber, R. Resel, A. Haase, B. Stadlober, and G. Jakopic J. Appl. Phys. 96 5 2004 2716
5. A. Kahn, N. Koch, and W. Gao J. Polym. Sci., Part B: Polym. Phys. 41 21 2003 2529
6. T. Sakurai, S. Toyoshima, H. Kitazume, S. Masuda, H. Kato, and K. Akimoto J. Appl. Phys. 107 4 2010 043707
7. Y. Gao, H. Ding, H. Wang, and D. Yan Appl. Phys. Lett. 91 14 2007 142112
8. W. Chen, D.C. Qi, Y.L. Huang, H. Huang, Y.Z. Wang, S. Chen, X.Y. Gao, and A.T.S. Wee J. Phys. Chem. C 113 29 2009 12832
9. X. Liu, M. Knupfer, and B.H. Huisman Surf. Sci. 595 1-3 2005 165
10. D.R.T. Zahn, G.N. Gavrila, and M. Gorgoi Chem. Phys. 325 1 2006 99
11. H. Peisert, M. Knupfer, and J. Fink Surf. Sci. 515 2-3 2002 491
12. M.B. Casu, P. Imperia, J.E. Wong, and S. Schrader Synth. Met. 138 1-2 2003 131
13. E.W. Forsythe, V.-E. Choong, T.Q. Le, and Y. Gao J. Vac. Sci. Technol. A 17 6 1999 3429
14. N. Koch, A. Vollmer, S. Duhm, Y. Sakamoto, and T. Suzuki Adv. Mater. 19 1 2007 112
15. F. Petraki, V. Papaefthimiou, and S. Kennou Org. Electron. 8 5 2007 522
16. W. Gao, and A. Kahn Appl. Phys. Lett. 82 26 2003 4815
17. S. Duhm, S. Hosoumi, I. Salzmann, A. Gerlach, M. Oehzelt, B. Wedl, T.-L. Lee, F. Schreiber, N. Koch, N. Ueno, and S. Kera Phys. Rev. B 81 4 2010 045418
18. T. Toader, G. Gavrila, W. Braun, J. Ivanco, and D.R.T. Zahn Phys. Status Solid B 246/7 2009 1510
19. Y. Ge, and J.E. Whitten J. Phys. Chem. C 112 4 2008 1174
20. M. Grobosch, and M. Knupfer Adv. Mater. 19 5 2007 754
21. M. Knupfer, and H. Peisert Phys. Status Solid A 201/6 2004 1055
22. H. Peisert, M. Knupfer, T. Schwieger, J.M. Auerhammer, M.S. Golden, and J. Fink J. Appl. Phys. 91 8 2002 4872
23. K.M. Lau, J.X. Tang, H.Y. Sun, C.S. Lee, S.T. Lee, and D. Yan Appl. Phys. Lett. 88 17 2006 173513
24. T. Toader, G. Gavrila, J. Ivanco, W. Braun, and D.R.T. Zahn Appl. Surf. Sci. 255 15 2009 6806
25. C. Shen, and A. Kahn J. Appl. Phys. 90 9 2001 4549
26. N.J. Watkins, and Y. Gao J. Appl. Phys. 94 9 2003 5782
27. I. Salzmann, S. Duhm, R. Opitz, R.L. Johnson, J.P. Rabe, and N. Koch J. Appl. Phys. 104 11 2008 114518
28. H. Fukagawa, H. Yamane, T. Kataoka, S. Kera, M. Nakamura, K. Kudo, and N. Ueno Phys. Rev. B 73 24 2006 245310
29. I.G. Hill, J. Schwartz, and A. Kahn Org. Electron. 1 1 2000 5
30. S. Park, T.U. Kampen, D.R.T. Zahn, and W. Braun Appl. Phys. Lett. 79 25 2001 4124
31. A. Rajagopal, C.I. Wu, and A. Kahn J. Appl. Phys. 83 5 1998 2649
32. J. Ivanco, T. Haber, R. Resel, F.P. Netzer, and M.G. Ramsey Thin Solid Films 514 1-2 2006 156
33. J. Ivanco, F.P. Netzer, and M.G. Ramsey J. Appl. Phys. 101 10 2007 103712
34. J. Ivanco, T. Haber, J.R. Krenn, F.P. Netzer, R. Resel, and M.G. Ramsey Surf. Sci. 601 1 2007 178
35. S. Duhm, G. Heimel, I. Salzmann, H. Glowatzki, R.L. Johnson, A. Vollmer, J.P. Rabe, and N. Koch Nat. Mater. 7 4 2008 326
36. W. Chen, D.-C. Qi, H. Huang, X. Gao, and A.T.S. Wee Adv. Funct. Mater. 21 3 2011 410
37. J. Ivanco, B. Winter, F.P. Netzer, M.G. Ramsey, L. Gregoratti, and M. Kiskinova Appl. Phys. Lett. 85 4 2004 585
38. G. Koller, B. Winter, M. Oehzelt, J. Ivanco, F.P. Netzer, and M.G. Ramsey Org. Electron. 8 1 2007 63
39. T.S. Ellis, K.T. Park, S.L. Hulbert, M.D. Ulrich, and J.E. Rowe J. Appl. Phys. 95 3 2004 982
40. M. Gorgoi, and D.R.T. Zahn Org. Electron. 6 4 2005 168
41. I. Salzmann, S. Duhm, G. Heimel, M. Oehzelt, R. Kniprath, R.L. Johnson, J. Rabe, and P.N. Koch J. Am. Chem. Soc. 13 0/39 2008 12870
42. H. Yanagi, and S. Okamoto Appl. Phys. Lett. 71 18 1997 2563
43. B. Winter, J. Ivanco, F.P. Netzer, and M.G. Ramsey Thin Solid Films 433 1-2 2003 269
44. M. Kiguchi, G. Yoshikawa, and K. Saiki J. Appl. Phys. 94 8 2003 4866
45. S. Duhm, H. Glowatzki, J.P. Rabe, N. Koch, and R.L. Johnson Appl. Phys. Lett. 88 20 2006 203109
46. G. Paasch, H. Peisert, M. Knupfer, J. Fink, and S. Scheinert J. Appl. Phys. 93 10 2003 6084
47. I.G. Hill, A.J. Makinen, and Z.H. Kafafi Appl. Phys. Lett. 77 12 2000 1825
48. C.E. Heiner, J. Dreyer, I.V. Hertel, N. Koch, H.H. Ritze, W. Widdra, and B. Winter Appl. Phys. Lett. 87 9 2005 093501
49. H. Peisert, I. Biswas, L. Zhang, M. Knupfer, M. Hanack, D. Dini, M.J. Cook, I. Chambrier, T. Schmidt, D. Batchelor, and T. Chassé Chem. Phys. Lett. 403 1-3 2005 1
50. S. Kowarik, A. Gerlach, S. Sellner, F. Schreiber, L. Cavalcanti, and O. Konovalov Phys. Rev. Lett. 96 12 2006 125504
51. H. Glowatzki, G.N. Gavrila, S. Seifert, R.L. Johnson, J. Rader, K. Mullen, D.R.T. Zahn, J.P. Rabe, and N. Koch J. Phys. Chem. C 112 5 2008 1570
52. I. Biswas, H. Peisert, M. Nagel, M.B. Casu, S. Schuppler, P. Nagel, E. Pellegrin, and T. Chasse J. Chem. Phys. 126 17 2007 174704
53. M. Oehzelt, G. Koller, J. Ivanco, S. Berkebile, T. Haber, R. Resel, F.P. Netzer, and M.G. Ramsey Adv. Mater. 18 18 2006 2466
54. G. Koller, S. Berkebile, J.R. Krenn, F.P. Netzer, M. Oehzelt, T. Haber, R. Resel, and M.G. Ramsey Nano Lett. 6 6 2006 1207
55. A. Hinderhofer, T. Hosokai, C. Frank, J. Novak, A. Gerlach, and F. Schreiber J. Phys. Chem. C 115 32 2011 16155
56. H. Yamane, Y. Yabuuchi, H. Fukagawa, S. Kera, K.K. Okudaira, and N. Ueno J. Appl. Phys. 99 9 2006 093705
57. W. Chen, H. Huang, S. Chen, Y.L. Huang, X.Y. Gao, and A.T.S. Wee Chem. Mater. 20 22 2008 7017
58. W. Chen, H. Huang, S. Chen, X.Y. Gao, and A.T.S. Wee J. Phys. Chem. C 112 13 2008 5036
59. J. Ivanco, and D.R.T. Zahn J. Vac. Sci. Technol. A 27 5 2009 1178
60. H. Fukagawa, S. Kera, T. Kataoka, S. Hosoumi, Y. Watanabe, K. Kudo, and N. Ueno Adv. Mater. 19 5 2007 665
61. I.G. Hill, A. Rajagopal, and A. Kahn J. Appl. Phys. 84 6 1998 3236
62. R. Resel J. Phys. Condens. Matter 20 2008 184009
63. T. Haber, S. Muellegger, A. Winkler, and R. Resel Phys. Rev. B 74 4 2006 045419
64. H. Ishii, K. Sugiyama, E. Ito, and K. Seki Adv. Mater. 11 8 1999 605
65. N.J. Watkins, L. Yan, and Y. Gao Appl. Phys. Lett. 80 23 2002 4384
66. L. Yan, N.J. Watkins, S. Zorba, Y. Gao, and C.W. Tang Appl. Phys. Lett. 81 15 2002 2752
67. N. Koch J. Phys. Condens. Matter 20/18 2008 184008
68. I.G. Hill, D. Milliron, J. Schwartz, and A. Kahn Appl. Surf. Sci. 166 1-4 2000 354
69. H. Vázquez, F. Flores, R. Oszwaldowski, J. Ortega, R. Pérez, and A. Kahn Appl. Surf. Sci. 234 1-4 2004 107
70. H. Vázquez, W. Gao, F. Flores, and A. Kahn Phys. Rev. B 71 4 2005 041306
71. H. Peisert, M. Knupfer, and J. Fink Appl. Phys. Lett. 81 13 2002 2400
72. H. Fukagawa, H. Yamane, S. Kera, K.K. Okudaira, and N. Ueno Phys. Rev. B 73 4 2006 041302
73. G.M. Rangger, O.T. Hofmann, L. Romaner, G. Heimel, B. Broker, R.-P. Blum, R.L. Johnson, N. Koch, and E. Zojer Phys. Rev. B 79 16 2009 165306
74. O.V. Molodtsova, T. Schwieger, and M. Knupfer Appl. Surf. Sci. 252 1 2005 143
75. A. Kahn, W. Zhao, W. Gao, H. Vázquez, and F. Flores Chem. Phys. 325 1 2006 129
76. K. Seki, N. Hayashi, H. Oji, E. Ito, Y. Ouchi, and H. Ishii Thin Solid Films 393 1-2 2001 298
77. M.L. Blumenfeld, M.P. Steele, and O.L.A. Monti J. Phys. Chem. Lett. 1 1 2010 145
78. N. Sato, K. Seki, and H. Inokuchi J. Chem. Soc. Faraday Trans. 2 77 1981 1621
79. W.R. Salaneck Phys. Rev. Lett. 40 1 1978 60
80. D.R. Lide CRC Handbook of Chemistry and Physics 1997 CRC Press Boca Raton
81. D.M. Alloway, A.L. Graham, X. Yang, A. Mudalige, R. Colorado, V.H. Wysocki, J.E. Pemberton, T. Randall Lee, R.J. Wysocki, and N.R. Armstrong J. Phys. Chem. C 113 47 2009 20328
82. J.W. Keister, J.E. Rowe, J.J. Kolodziej, and T.E. Madey J. Vac. Sci. Technol. A 18 4 2000 2174
83. S. Narioka, H. Ishii, D. Yoshimura, M. Sei, Y. Ouchi, K. Seki, S. Hasegawa, T. Miyazaki, Y. Harima, and K. Yamashita Appl. Phys. Lett. 67 13 1995 1899
84. R.T. Tung Phys. Rev. Lett. 84 26 2000 6078
85. W. Xie, J. Xu, J. An, and K. Xue J. Phys. Chem. C 114 44 2010 19044
86. S.M. Sze, and K.N. Kwok Physics of Semiconductor Devices 2007 Wiley-Interscience New York
87. R.J. Kline, M.D. McGehee, and M.F. Toney Nat. Mater. 5 2006 222
88. E. Bechtold, and H. Leonhard Surf. Sci. 151 2-3 1985 521
89. H.B. Wang, and D.H. Yan NPG Asia Mater. 2 2010 69
90. M.L. Tang, A.D. Reichardt, P. Wei, and Z. Bao J. Am. Chem. Soc. 131 14 2009 5264
91. K. Wandelt Appl. Surf. Sci. 111 1997 1