Origin of the highest occupied band position in pentacene films from ultraviolet photoelectron spectroscopy: Hole stabilization versus band dispersion

Physical Review B - Condensed Matter and Materials Physics

Volumn 73, Issue 24, 2006, Pages

  Fukagawa, H ^a   Yamane, H ^a   Kataoka, T ^a   Kera, S ^a   Nakamura, M ^a   Kudo, K ^a   Ueno, N ^a  

^a CHIBA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33745091138     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.73.245310     Document Type: Article

References (42)

1. W. R. Salaneck, K. Seki, A. Kahn, and J. J. Pireaux, Conjugated Polymer and Molecular Interfaces (Marcel Dekker, New York, 2002).
2. H. Ishii, K. Sugiyama, E. Ito, and K. Seki, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/(SICI)1521-4095(199906)11:8<605::AID-ADMA605>3.0. CO;2-Q 11, 605 (1999).
3. D. Cahen, A. Kahn, and E. Umbach, Mater. Today MTOUAN 1369-7021 10.1016/S1369-7021(05)70985-8 8, 32 (2005).
4. H. Vazquez, W. Gao, F. Flores, and A. Kahn Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.71.041306 71, 041306 (R) (2005).
5. O. V. Molodtsova and M. Knupfer, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2175468 99, 053704 (2006).
6. W. Gao and A. Kahn, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1424067 79, 4040 (2001).
7. W. Gao and A. Kahn, Org. Electron. OERLAU 1566-1199 10.1016/S1566- 1199(02)00033-2 3, 53 (2002).
8. W. Gao and A. Kahn, J. Phys.: Condens. Matter JCOMEL 0953-8984 10.1088/0953-8984/15/38/014 15, S2757 (2003).
9. W. Gao and A. Kahn, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1585123 82, 4815 (2003).
10. A. Kahn, N. Koch, and W. Gao, J. Polym. Sci., Part B: Polym. Phys. JPBPEM 0887-6266 10.1002/polb.10642 41, 2529 (2003).
11. J. Xue and S. R. Forrest, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.69.245322 69, 245322 (2004).
12. S. Tanaka, E. Kawabe, K. Kanai, T. Iwahashi, T. Nishi, Y. Ouchi, and K. Seki, J. Electron Spectrosc. Relat. Phenom. JESRAW 0368-2048 144-147, 533 (2005).
13. N. Koch, S. Duhm, J. P. Rabe, S. Rentenberger, R. L. Johnson, J. Klankermayer, and F. Schreiber, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2041838 87, 101905 (2005).
14. H. Yamane, Y. Yabuuchi, H. Fukagawa, S. Kera, K. K. Okudaira, and N. Ueno, J. Appl. Phys. JAPIAU 0021-8979 99, 093705 (2006).
15. M. Shtein, J. Mapel, J. B. Benziger, and S. R. Forrest, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1491009 81, 268 (2002).
16. C. D. Dimitrakopoulos and P. R. L. Malenfant, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/1521-4095(20020116)14:2<99::AID-ADMA99>3.0. CO;2-9 14, 99 (2002).
17. H. Yanagisawa, T. Tamaki, M. Nakamura, and K. Kudo, Thin Solid Films THSFAP 0040-6090 464-465, 398 (2004).
18. F. Gutmann and L. E. Lyons, Organic Semiconductors (John Wiley, New York, 1970), Chap..
19. N. Sato, Electro. and Relat. Propert. of Org. Solids. 157 (1997).
20. T. S. Ellis, K. T. Park, S. L. Hulbert, M. D. Ulrich, and J. E. Rowe, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1637137 95, 982 (2004).
21. F. Amy, C. Chan, and A. Kahn, Org. Electron. OERLAU 1566-1199 10.1016/j.orgel.2005.03.003 6, 85 (2005).
22. A. Troisi and G. Orlandi, J. Phys. Chem. B JPCBFK 1089-5647 10.1021/jp0457489 109, 1849 (2005).
23. G. A. de Wijs, C. C. Mattheus, R. A. de Groot, and T. T. M. Palstra, Synth. Met. SYMEDZ 0379-6779 10.1016/S0379-6779(03)00020-1 139, 109 (2003).
24. S. Kera, H. Yamane, I. Sakuragi, K. K. Okudaira, and N. Ueno, Chem. Phys. Lett. CHPLBC 0009-2614 10.1016/S0009-2614(02)01302-7 364, 93 (2002).
25. C. Ludwig, R. Strohmaier, J. Petersen, B. Gompf, and W. Eisenmenger, J. Vac. Sci. Technol. B JVTBD9 0734-211X 10.1116/1.587680 12, 1963 (1994).
26. S. D. Wang, X. Dong, C. S. Lee, and S. T. Lee, J. Phys. Chem. B JPCBFK 1089-5647 108, 1529 (2004).
27. H. Yamane, H. Fukagawa, S. Nagamatsu, M. Ono, S. Kera, K. K. Okudaira, and N. Ueno, IPAP Conf. Series 6, 19 (2005).
28. H. Yamane, S. Nagamatsu, H. Fukagawa, S. Kera, R. Friedlein, K. K. Okudaira, and N. Ueno, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.72.153412 72, 153412 (2005).
29. R. Ruiz, A. C. Mayer, G. G. Malliaras, B. Nickel, G. Scoles, A. Kazimirov, H. Kim, R. L. Headrick, and Z. Islam, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1826229 85, 4926 (2004).
30. S. E. Fritz, S. M. Martin, C. D. Frisbie, M. D. Ward, and M. F. Toney, J. Am. Chem. Soc. JACSAT 0002-7863 10.1021/ja049726b 126, 4084 (2004).
31. B. Nickel, R. Barabash, R. Ruiz, N. Koch, A. Kahn, L. C. Feldman, R. F. Haglund, and G. Scoles, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.70.125401 70, 125401 (2004).
32. G. Horowitz, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/(SICI)1521-4095(199803)10:5<365::AID-ADMA365>3.3.CO;2-L 10, 365 (1998).
33. N. Sato, K. Seki, H. Inokuchi, and Y. Harada, Chem. Phys. CMPHC2 0301-0104 10.1016/0301-0104(86)80194-X 109, 157 (1986).
34. H. Ozaki, J. Chem. Phys. JCPSA6 0021-9606 10.1063/1.1308518 113, 6361 (2000).
35. N. Ueno, S. Kiyono, and T. Watanabe, Chem. Phys. Lett. CHPLBC 0009-2614 46, 89 (1977).
36. N. Ueno, K. Sugita, and T. Shinmura, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.44.6472 44, 6472 (1991).
37. M. Oehzelt, R. Resel, C. Suess, R. Friedlein, and W. R. Salaneck, J. Chem. Phys. JCPSA6 0021-9606 10.1063/1.2150826 124, 054711 (2006).
38. V. Coropceanu, M. Malagoli, D. A. da Silva Filho, N. E. Gruhn, T. G. Bill, and J. L. Brédas, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.89.275503 89, 275503 (2002).
39. J. Takeya, C. Goldmann, S. Haas, K. P. Pernstich, B. Ketterer, and B. Batlogg, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1618919 94, 5800 (2003).
40. N. Koch, A. Kahn, J. Ghijsen, J.-J. Pireaux, J. Schwartz, R. L. Johnson, and A. Elschner, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1532102 82, 70 (2003).
41. N. Koch, A. Elschner, J. P. Rabe, and R. L. Johnson, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/adma.200400697 17, 330 (2005).
42. T. Schwieger, X. Liu, D. Olligs, M. Knupfer, and Th. Schmidt, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1805183 96, 5596 (2004).