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Volumn 258, Issue 8, 2012, Pages 3864-3870

Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering

(6) Lv, Yanhong a,b Ji, Li a Liu, Xiaohong a Li, Hongxuan a Zhou, Huidi a Chen, Jianmin a

a LANZHOU INSTITUTE OF CHEMICAL PHYSICS (China)

b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES (China)

Author keywords

Corrosion resistance; CrAlN films; Mechanical properties; Microstructure

Indexed keywords

ALUMINUM ALLOYS; CHROMIUM ALLOYS; CORROSION RESISTANCE; DEPOSITION RATES; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; MICROSTRUCTURE; SUBSTRATES; SURFACE ROUGHNESS;

AVERAGE SURFACE ROUGHNESS; CRALN FILMS; MECHANICAL AND TRIBOLOGICAL PROPERTIES; STAINLESS STEEL SUBSTRATES; STRUCTURE AND PROPERTIES; SUBSTRATE BIAS VOLTAGES; UNBALANCED MAGNETRON SPUTTERING; UNBALANCED MAGNETRON SPUTTERING SYSTEMS;

BIAS VOLTAGE;

EID: 84856224383 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.12.048 Document Type: Article

Times cited : (109)

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