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Volumn 508, Issue 1, 2010, Pages 191-195

A comparative study of CrAlN films synthesized by dc and pulsed dc reactive magnetron facing target sputtering system with different pulse frequencies

(6) Khamseh, S a Nose, M a Kawabata, T a Nagae, T a Matsuda, K a Ikeno, S a

a UNIVERSITY OF TOYAMA (Japan)

Author keywords

Balanced magnetron sputtering; CrAlN; dc Magnetron sputtering; Pulse frequency; Pulsed magnetron sputtering

Indexed keywords

BALANCED MAGNETRON SPUTTERING; CRALN; DC MAGNETRON SPUTTERING; PULSE FREQUENCIES; PULSED MAGNETRON SPUTTERING;

HARDNESS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; NANOINDENTATION; SODIUM CHLORIDE;

FILM PREPARATION;

EID: 77957335781 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2010.08.042 Document Type: Article

Times cited : (34)

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