Effects of substrate bias frequencies on the characteristics of chromium nitride coatings deposited by pulsed DC reactive magnetron sputtering

Surface and Coatings Technology

Volumn 203, Issue 5-7, 2008, Pages 721-725

  Lee, Jyh Wei ^a   Kuo, Yu Chu ^b   Wang, Chaur Jeng ^b   Chang, Li Chun ^c   Liu, Kuan Ting ^d  

^a TUNGNAN UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^c MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^d NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Adhesion properties; Chromium nitride; Pulsed DC reactive magnetron sputtering system; Substrate bias current; Substrate bias frequency

Indexed keywords

ADHESION; BIAS CURRENTS; CHROMIUM; CORROSION RESISTANCE; MAGNETRONS; MECHANICAL PROPERTIES; NITRIDES; SUBSTRATES; THICK FILMS; THIN FILMS; WEAR RESISTANCE;

ADHESION PROPERTIES; CHROMIUM NITRIDE; PULSED DC REACTIVE MAGNETRON SPUTTERING SYSTEM; SUBSTRATE BIAS CURRENT; SUBSTRATE BIAS FREQUENCY;

MAGNETRON SPUTTERING;

EID: 55749091596     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.08.039     Document Type: Article

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