The effect of substrate bias voltages on impact resistance of CrAlN coatings deposited by modified ion beam enhanced magnetron sputtering

Applied Surface Science

Volumn 255, Issue 7, 2009, Pages 4033-4038

  Chunyan, Yu ^a   Linhai, Tian ^a   Yinghui, Wei ^a   Shebin, Wang ^a   Tianbao, Li ^a   Bingshe, Xu ^a  

^a TAIYUAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

CrAlN coatings; Fracture toughness; Hardness; Impact resistance

Indexed keywords

ALUMINUM ALLOYS; ATOMIC FORCE MICROSCOPY; BIAS VOLTAGE; CHROMIUM ALLOYS; COATINGS; FRACTURE TOUGHNESS; HARDNESS; IMPACT RESISTANCE; ION BEAMS; MAGNETRON SPUTTERING; SODIUM CHLORIDE; SUBSTRATES; X RAY DIFFRACTION;

DENSE STRUCTURES; DIFFRACTION PEAKS; IMPACT PROPERTY; ION BEAM ENHANCED MAGNETRON SPUTTERING; RESISTANCE TESTS; SUBSTRATE BIAS VOLTAGES; SUBSTRATE NEGATIVE BIAS; TWO-DIMENSIONAL SURFACE;

BORON COMPOUNDS;

EID: 58149102312     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.10.089     Document Type: Article

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