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Volumn 176, Issue 11, 2011, Pages 850-854

Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering

(7) Kong, Qinghua a,b Ji, Li a Li, Hongxuan a Liu, Xiaohong a Wang, Yongjun a,b Chen, Jianmin a Zhou, Huidi a

a LANZHOU INSTITUTE OF CHEMICAL PHYSICS (China)

b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES (China)

Author keywords

CrN films; Medium frequency magnetron sputtering; Microstructure; Residual stress; Substrate bias voltage

Indexed keywords

BIAS VOLTAGE; CHROMIUM ALLOYS; CHROMIUM COMPOUNDS; COMPRESSIVE STRESS; LATTICE CONSTANTS; MAGNETRON SPUTTERING; RESIDUAL STRESSES; SUBSTRATES; SURFACE ROUGHNESS;

AS-DEPOSITED FILMS; CRN FILM; MEDIUM-FREQUENCY MAGNETRON SPUTTERING; ORIENTED STRUCTURE; SI (1 1 1); SUBSTRATE BIAS VOLTAGES; SYSTEMATIC VARIATION;

MICROSTRUCTURE;

EID: 79957704509 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/j.mseb.2011.04.015 Document Type: Article

Times cited : (68)

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