SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 204, Issue 6-7, 2009, Pages 907-910

The effects of composition and pulsed biasing on chromium nitride films

(5) Freeman, J A a Kelly, P J a West, G T a Bradley, J W b Iordanova, I c

a MANCHESTER METROPOLITAN UNIVERSITY (United Kingdom)

b UNIVERSITY OF LIVERPOOL (United Kingdom)

c UNIVERSITY OF SOFIA (Bulgaria)

Author keywords

Chrome; Nitride

Indexed keywords

CHROME; CHROMIUM NITRIDE; CHROMIUM NITRIDE COATINGS; CHROMIUM NITRIDE FILMS; FILM PROPERTIES; INDUSTRY STANDARDS; ION CURRENTS; ION ETCHING; MID-FREQUENCY; NITROGEN GAS FLOW; PROCESS PARAMETERS; PULSED BIASING; SCRATCH ADHESION TESTING; SEM; STABLE FORM; STRUCTURE AND PROPERTIES; TARGET VOLTAGE; TRIBOLOGICAL PROPERTIES; WEAR-RESISTANT; XRD;

AERODYNAMICS; BORIDE COATINGS; CHROMIUM; FLOW OF GASES; HARD COATINGS; PLASMAS;

NITRIDES;

EID: 71849097862 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2009.05.049 Document Type: Article

Times cited : (27)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.