EUV resists: Illuminating the challenges

Journal of Photopolymer Science and Technology

Volumn 24, Issue 6, 2011, Pages 637-642

  Naulleau, Patrick ^a   Anderson, Chris ^a   George, Simi ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Extreme ultraviolet; Line edge roughness; Photoresist; Shot noise

Indexed keywords

EID: 84855791748     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.24.637     Document Type: Article

References (19)

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