Resolution capability of SFET with slit and dipole illumination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Tanaka, Yuusuke ^a,b   Matsunaga, Kentaro ^a   Magoshi, Shunko ^a   Shirai, Seiichiro ^a   Tawarayama, Kazuo ^a   Tanaka, Hiroyuki ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b RENESAS TECHNOLOGY CORP   (Japan)

Author keywords

annular; EUVL; image contrast; LWR; SFET; x dipole; x slit; y slit

Indexed keywords

ANNULAR; EUVL; IMAGE CONTRAST; LWR; SFET; X-DIPOLE; X-SLIT; Y-SLIT;

EXPOSURE METERS; PHOTORESISTS;

DEGRADATION;

EID: 79954469432     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.870332     Document Type: Conference Paper

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