Effects of laser fluence on the structural properties of pulsed laser deposited ruthenium thin films

Applied Physics A: Materials Science and Processing

Volumn 100, Issue 2, 2010, Pages 561-568

  Lee, Wai Keat ^a   Wong, Hin Yong ^a   Chan, Kah Yoong ^a   Yong, Thian Khok ^b   Yap, Seong Shan ^c   Tou, Teck Yong ^a  

^a MULTIMEDIA UNIVERSITY   (Malaysia)

^b UNIVERSITI TUNKU ABDUL RAHMAN   (Malaysia)

^c NORWEGIAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Norway)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PROCESS; ENERGY DISPERSIVE X-RAY SPECTROSCOPY; GRAIN SIZE; HIGH PURITY; IN-VACUUM; LASER FLUENCES; LASER INDUCED; LASER WAVELENGTH; LOW TEMPERATURES; PULSED LASER; PULSED ND:YAG LASER; RIPPLE FORMATION; ROOM TEMPERATURE; RU FILM; RU THIN FILMS; SCHERRER FORMULA; SEM; SURFACE PROFILOMETRY; XRD SPECTRA;

DEPOSITION; DROP FORMATION; EMISSION SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; MICROELECTRONICS; OPTICAL EMISSION SPECTROSCOPY; PULSED LASER DEPOSITION; PULSED LASERS; RUTHENIUM; SCANNING ELECTRON MICROSCOPY; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY SPECTROSCOPY;

NEODYMIUM LASERS;

EID: 84655170860     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-010-5875-x     Document Type: Article

References (39)

1. M.N. Ashfold, F. Claeyssens, G.M. Fuge, S.J. Henley, Pulsed laser ablation and deposition of thin films. Chem. Soc. Rev. 33(1), 9 (2004)
2. D.B. Chrisey, G.K. Hubler, Pulsed Laser Deposition of Thin Films (Wiley Interscience, New York, 1994)
3. 2. Appl. Surf. Sci. 197-198, 379 (2002)
4. T.N. Arunagiri, Y. Zhang, O. Chyan, M. El-Bouanani, M.J. Kim, K.H. Chen, C.T. Wu, L.C. Chen, 5 nm ruthenium thin film as a directly plateable copper diffusion barrier. Appl. Phys. Lett. 86(8), 083104 (2005)
5. M.L. Green, M.E. Gross, L.E. Papa, K.J. Schnoes, D. Brasen, Chemical vapor deposition of ruthenium and ruthenium dioxide films. J. Electrochem. Soc. 132(11), 2677 (1985)
6. 2 thin film layers for electrode applications. Microelectron. Eng. 82(3-4), 242 (2005)
7. S.Y. Kang, C.S. Hwang, H.J. Kim, Improvements in growth behavior of CVD Ru films on film substrates for memory capacitor integration. J. Electrochem. Soc. 152(1), C15 (2005)
8. S.Y. Kang, S.Y. No, J.H. Choi, C.S. Hwang, H.J. Kim, Pt-doped Ru films prepared by CVD as electrodes for DRAM capacitors. Electrochem. Solid-State Lett. 8(1), C12 (2005)
9. 5 with Ru electrode. Jpn. J. Appl. Phys. 39, 3 (2000) (Part 1, No. 4B)
10. 5/CVD-Ru capacitor with concave structure for multigigabit-scale DRAM generation, in International Electron Devices Meet, IEEE (2001)
11. S.J. Won, W.D. Kim, C.Y. Yoo, S.T. Kim, Y.W. Park, J.T. Moon, M.Y. Lee, Conformal CVD-ruthenium process for MIM capacitor in giga-bit DRAMs, in International Electron Devices Meet, IEEE (2000)
12. N. Inoue, N. Furutake, A. Toda, M. Tada, Y. Hayashi, PZT MIM capacitor with oxygen-doped Ru-electrodes for embedded FeRAM devices, in IEEE Transactions on Electron Devices, IEEE (2005)
13. 8) precursor. Jpn. J. Appl. Phys. 41, 6852 (2002) (Part 1, No. 11B)
14. M. Tapajna, P. Pisecny, R. Luptak, K. Husekova, K. Frohlich, L. Harmatha, J.C. Hooker, F. Roozeboom, J. Jergel, Application of Ru-based gate materials for CMOS technology. Mater. Sci. Semi-cond. Process. 7(4-6), 271 (2004)
15. 2 and Hf-based high-k gate dielectrics. J. Appl. Phys. 98(4), 043520-1 (2005)
16. D. Josell, D. Wheeler, C. Witt, T.P. Moffat, Seedless superfill: copper electrodeposition in trenches with ruthenium barriers. Elec-trochem. Solid-State Lett. 6(10), C143 (2003)
17. R. Chan, T.N. Arunagiri, Y. Zhang, O. Chyan, R.M. Wallace, M.J. Kim, T.Q. Hurd, Diffusion studies of copper on ruthenium thin film. Electrochem. Solid-State Lett. 7(8), G154 (2004)
18. O. Chyan, T.N. Arunagiri, T. Ponnuswamy, Electrodeposition of copper thin film on ruthenium. J. Electrochem. Soc. 150(5), C347 (2003)
19. K. Kawano, A. Nagai, H. Kosuge, T. Shibutami, N. Os-hima, H. Funakubo, Seed layer free conformal ruthenium film deposition on hole substrates by MOCVD using (2,4-dimethylpentadienyl)(ethylcyclopentadienyl)ruthenium. Electro-chem. Solid-State Lett. 9(7), C107 (2006)
20. H. Kim, The application of atomic layer deposition for metallization of 65 nm and beyond. Surf. Coat. Technol. 200(10), 3104 (2006)
21. T.B. Massalski, Binary Alloy Phase Diagrams, 2nd edn. (Materials Information Society, 1990)
22. S.N. Piramanayagam, J.Z. Shi, H.B. Zhao, C.S. Mah, J.R. Shi, J.M. Zhao, J. Zhang, Y.S. Kay, Novel approaches to high-density perpendicular recording media. J. Magn. Magn. Mater. 303(2), 287 (2006)
23. T.N. Arunagiri, Y. Zhang, O. Chyan, M.J. Kim, T.Q. Hurd, In-terfacial diffusion studies of Cu/(5 nm Ru)/Si structures. J. Elec-trochem. Soc. 152(11), G808 (2005)
24. J.J. Tan, X.P. Qu, Q. Xie, Y. Zhou, G.P. Ru, The properties of Ru on Ta-based barriers. Thin Solid Films. 504(1-2), 231 (2006)
25. Y.S. Kim, H.I. Kim, J.H. Cho, H.K. Seo, G.S. Kim, S.G. Ansari, G. Khang, J.J. Senkevich, H.S. Shin, Electrochemical deposition of copper and ruthenium on titanium. Electrochim. Acta 51(25), 5445 (2006)
26. H. Kim, Y. Kojima, H. Sato, N. Yoshii, S. Hosaka, Y. Shimogaki, Influence of crystal orientation of Ru under-layer on initial growth of copper chemical vapor deposition. Jpn. J. Appl. Phys. 45(8), 3 (2005)
27. 4, solvent solution for pure ruthenium film depositions. Microelectron. Eng. 83(11-12), 2248 (2006)
28. S. Yamada, Y. Nishibe, M. Saizaki, H. Kitajima, S. Ohtsubo, A. Morimoto, T. Shimizu, K. Ishida, Y. Masaki, Rotational honeycomb epitaxy of Ru thin films on sapphire (0001) substrate. Jpn. J. Appl. Phys. 41, 3 (2002) (Part 2, No. 2B)
29. 7-X thin films. Appl. Phys. Lett. 59(5), 594 (1991)
30. 7-X thin films, in Symp. N, MRS Spring Meet, Material Research Society Symposium Proceedings (1990)
31. D.J. Krajnovich, J.E. Vazquez, Formation of "intrinsic" surface defects during 248 nm photoablation of polyimide. J. Appl. Phys. 73(6), 3001 (1993)
32. D.J. Krajnovich, J.E. Vazquez, R.J. Savoy, Impurity-driven cone formation during laser sputtering of graphite. Science 259, 3 (1993)
33. M. Birnbaum, Semiconductor surface damage produced by ruby lasers. J. Appl. Phys. 36(11), 3688 (1965)
34. D.C. Emmony, R.P. Howson, L.J. Willis, Laser mirror damage in germanium at 10.6 μ m. Appl. Phys. Lett. 23(11), 598 (1973)
35. P.E. Dyer, S.D. Jenkins, J. Sidhu, Development and origin of conical structures on XeCl laser ablated polyimide. Appl. Phys. Lett. 49(8), 453 (1986)
36. 7 single phase superconductors. Appl. Phys. Lett. 52(3), 239 (1988)
37. NIST Atomic Spectra Database
38. B.D. Ngom, T. Mpahane, N. Manyala, O. Nemraoui, U. Buttner, J.B. Kana, A.Y. Fasasi, M. Maaza, A.C. Beye, Structural and optical properties of nano-structured tungsten-doped ZnO thin films grown by pulsed laser deposition. Appl. Surf. Sci. 255(7), 4153 (2009)
39. M.E. Day, M. Delfino, J.A. Fair, W. Tsai, Correlation of electrical resistivity and grain size in sputtered titanium films. Thin Solid Films 254(1-2), 285 (1995)